Plasma-produced ZnO nanorod arrays as an antireflective layer in c-Si solar cells
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In this work, we develop a simple customized radio-frequency plasma-enhanced horizontal tube furnace deposition system to directly grow high-quality ZnO nanorod arrays on zinc films and investigate their application as an antireflective layer in n+pp+ monocrystalline silicon (c-Si) solar cells. Field emission scanning electron microscope, X-ray diffractometer, and transmission electron microscope studies reveal that ZnO nanorod arrays feature a perfect crystalline wurtzite structure and grow preferentially along  direction. The antireflective performance of ZnO nanorod arrays is confirmed by Fresnel coefficient matrix method and MATLAB software calculation. Furthermore, PC1D simulation demonstrates that the photovoltaic property for c-Si solar cells of the pyramid-textured front surface using ZnO nanorod arrays as an antireflective layer is much better than that for the other three types of c-Si solar cells (i.e., c-Si solar cells of the pyramid-textured front surface without using any antireflective layer, c-Si solar cells of the planar front surface using ZnO nanorod arrays as an antireflective layer, as well as c-Si solar cells of the planar front surface without using any antireflective layer). In particular, the photovoltaic conversion efficiency of 20.23% has been achieved for c-Si solar cells of the pyramid-textured front surface using ZnO nanorod arrays as an antireflective layer. This work is highly relevant to the development of an advanced process for the realization of high-efficiency, low-cost, and stable solar cells.
This work was supported by Shenzhen Science and Technology Innovation Committee (Grant No. JCYJ20170306141238532; Project name: Research on the fabrication of graphene nanowalls and relevant application in the Si-based heterojunction solar cells), China.
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Conflict of interest
The authors declare that they have no conflict of interest.
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