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Journal of Materials Science

, Volume 48, Issue 10, pp 3863–3869 | Cite as

Atomic force microscopy nanolithography: fabrication of metallic nano-slits using silicon nitride tips

  • Tobias König
  • Thomas Papke
  • Alexey Kopyshev
  • Svetlana Santer
Article

Abstract

In this paper, we report on the properties of nano-slits created in metal thin films using atomic force microscope (AFM) nanolithography (AFM-NL). We demonstrate that instead of expensive diamond AFM tips, it is also possible to use low cost silicon nitride tips. It is shown that depending on the direction of scratching, nano-slits of different widths and depths can be fabricated at constant load force. We elucidate the reasons for this behavior and identify an optimal direction and load force for scratching a gold layer.

Graphical Abstract

Keywords

Atomic Force Microscope Silicon Nitride Metal Layer Load Force Wear Depth 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgements

This research is supported by the DFG grant SA1657/4-1.

Supplementary material

10853_2013_7188_MOESM1_ESM.docx (208 kb)
Supplementary material 1 (DOCX 207 kb)

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Copyright information

© Springer Science+Business Media New York 2013

Authors and Affiliations

  • Tobias König
    • 1
  • Thomas Papke
    • 1
  • Alexey Kopyshev
    • 1
  • Svetlana Santer
    • 1
  1. 1.Department of Experimental Physics, Institute for Physics and AstronomyUniversity of PotsdamPotsdamGermany

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