Journal of Materials Science

, Volume 44, Issue 14, pp 3731–3735 | Cite as

Effect of the titanium ion concentration on electrodeposition of nanostructured TiNi films

  • Hae-Min Lee
  • Santosh K. Mahapatra
  • John Kiran Anthony
  • Fabian Rotermund
  • Chang-Koo KimEmail author


Electrodeposition of nanostructured titanium–nickel films was performed and the effect of the concentration of the titanium source on the film characteristics was investigated. Scanning electron microscopy indicated circular crystallites on the surface of the electrodeposited titanium–nickel film with a fairly uniform size distribution. XRD studies showed that the electrodeposited TiNi films contained TiNi with a preferred crystallographic orientation of [002]. Surface analysis using X-ray photoelectron spectroscopy (XPS) revealed that the electrodeposited titanium–nickel film contained elemental titanium and nickel, hydroxide of nickel, and oxides of titanium and nickel. As the titanium ion concentration was increased, the titanium content in the film was increased while the deposition rate and crystallite size of the film were decreased. A blue-shift in the UV/Vis peak was also observed with increasing titanium ion concentration.


TiNi TiNi Film Nickel Sulfate Surface Plasmon Resonance Peak Nickel Film 



This work was supported by the Basic Research Program of the Korea Science and Engineering Foundation (Grant No. R01-2006-000-11264-0), an Ajou University Research Fellowship 2007 (Grant No. 20072650), and Eugene Technology, Ltd.


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Copyright information

© Springer Science+Business Media, LLC 2009

Authors and Affiliations

  • Hae-Min Lee
    • 1
  • Santosh K. Mahapatra
    • 1
    • 2
  • John Kiran Anthony
    • 1
  • Fabian Rotermund
    • 1
  • Chang-Koo Kim
    • 1
    Email author
  1. 1.Division of Energy Systems ResearchAjou UniversitySuwonKorea
  2. 2.Department of Applied PhysicsBirla Institute of TechnologyMesra, RanchiIndia

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