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Journal of Materials Science

, Volume 44, Issue 14, pp 3731–3735 | Cite as

Effect of the titanium ion concentration on electrodeposition of nanostructured TiNi films

  • Hae-Min Lee
  • Santosh K. Mahapatra
  • John Kiran Anthony
  • Fabian Rotermund
  • Chang-Koo KimEmail author
Article

Abstract

Electrodeposition of nanostructured titanium–nickel films was performed and the effect of the concentration of the titanium source on the film characteristics was investigated. Scanning electron microscopy indicated circular crystallites on the surface of the electrodeposited titanium–nickel film with a fairly uniform size distribution. XRD studies showed that the electrodeposited TiNi films contained TiNi with a preferred crystallographic orientation of [002]. Surface analysis using X-ray photoelectron spectroscopy (XPS) revealed that the electrodeposited titanium–nickel film contained elemental titanium and nickel, hydroxide of nickel, and oxides of titanium and nickel. As the titanium ion concentration was increased, the titanium content in the film was increased while the deposition rate and crystallite size of the film were decreased. A blue-shift in the UV/Vis peak was also observed with increasing titanium ion concentration.

Keywords

TiNi TiNi Film Nickel Sulfate Surface Plasmon Resonance Peak Nickel Film 

Notes

Acknowledgements

This work was supported by the Basic Research Program of the Korea Science and Engineering Foundation (Grant No. R01-2006-000-11264-0), an Ajou University Research Fellowship 2007 (Grant No. 20072650), and Eugene Technology, Ltd.

References

  1. 1.
    Humbeeck JV (1999) Mater Sci Eng A 273–275:134CrossRefGoogle Scholar
  2. 2.
    Fu Y, Du H, Huang W, Zhang S, Hu M (2004) Sens Actuator A 112:395CrossRefGoogle Scholar
  3. 3.
    Ishida A, Martynov V (2002) MRS Bull 27:111CrossRefGoogle Scholar
  4. 4.
    Krulevitch P, Lee AP, Ramsey PB, Trevino JC, Hamilton J, Northrup MA (1996) J Microelectromech Syst 5:270CrossRefGoogle Scholar
  5. 5.
    Kahn H, Huff MA, Heuer AH (1998) J Micromech Microeng 8:213CrossRefGoogle Scholar
  6. 6.
    Miyazaki S, Ishida A (1999) Mater Sci Eng A 273–275:106CrossRefGoogle Scholar
  7. 7.
    Li C, Nikumb S, Wong F (2006) Opt Lasers Eng 44:1078CrossRefGoogle Scholar
  8. 8.
    Makino E, Uenoyama M, Shibata T (1998) Sens Actuator A 71:187CrossRefGoogle Scholar
  9. 9.
    Castro AT, Cuellar EL, Mendez UO, Yacaman MJ (2008) Mater Sci Eng A 481–482:476CrossRefGoogle Scholar
  10. 10.
    Tan L, Crone WC (2002) Acta Mater 50:4449CrossRefGoogle Scholar
  11. 11.
    Nourmohammadi A, Bahrevar MA, Schulze S, Hietschold (2008) J Mater Sci 43:4753. doi: https://doi.org/10.1007/s10853-008-2665-3 CrossRefGoogle Scholar
  12. 12.
    Xu J, Xu Y (2008) J Mater Sci 43:4163. doi: https://doi.org/10.1007/s10853-006-1222-1 CrossRefGoogle Scholar
  13. 13.
    Kaneko Y, Sakakibara H, Hashimoto S (2008) J Mater Sci 43:3931. doi: https://doi.org/10.1007/s10853-007-2371-6 CrossRefGoogle Scholar
  14. 14.
    Leska B, Pankiewicz R, Gierczyk B, Schroeder G, Brzezinski B (2008) J Mater Sci 43:3459. doi: https://doi.org/10.1007/s10853-007-2279-1 CrossRefGoogle Scholar
  15. 15.
    Bhuiyan MS, Talyor BJ, Paranthaman M, Thompson JR, Sinclair JW (2008) J Mater Sci 43:1644. doi: https://doi.org/10.1007/s10853-007-2383-2 CrossRefGoogle Scholar
  16. 16.
    Tu WY, Xu BS, Dong SY, Wang HD, Bin J (2008) J Mater Sci 43:1102. doi: https://doi.org/10.1007/s10853-007-2259-5 CrossRefGoogle Scholar
  17. 17.
    Dulal SMSI, Yoon HJ, Shin CB, Kim CK (2007) J Electrochem Soc 154:D494CrossRefGoogle Scholar
  18. 18.
    Dulal SMSI, Yoon HJ, Shin CB, Kim CK (2007) Electrochim Acta 53:934CrossRefGoogle Scholar
  19. 19.
    Gleiter H (2000) Acta Mater 48:1CrossRefGoogle Scholar
  20. 20.
    Hosseini M, Yasaei B (1998) Ceram Int 24:543CrossRefGoogle Scholar
  21. 21.
    Hostetler MJ, Zhong CJ, Yen BKH, Anderegg J, Gross SM, Evans ND, Porter M, Murray RW (1998) J Am Chem Soc 120:9396CrossRefGoogle Scholar
  22. 22.
    Sangpour P, Akhavan O, Moshfegh AZ (2007) Appl Surf Sci 253:7438CrossRefGoogle Scholar
  23. 23.
    Ibrahim MAM, Rehim SSA, Moussa SO (2003) J Appl Electrochem 33:627CrossRefGoogle Scholar
  24. 24.
    Dulal SMSI, Shin CB, Sung JY, Kim CK (2008) J Appl Electrochem 38:83CrossRefGoogle Scholar
  25. 25.
    Robin A, de Lepinay J, Barbier MJ (1987) J Electroanal Chem 230:125CrossRefGoogle Scholar
  26. 26.
    Petterson AL (1939) Phys Rev 56:978CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media, LLC 2009

Authors and Affiliations

  • Hae-Min Lee
    • 1
  • Santosh K. Mahapatra
    • 1
    • 2
  • John Kiran Anthony
    • 1
  • Fabian Rotermund
    • 1
  • Chang-Koo Kim
    • 1
    Email author
  1. 1.Division of Energy Systems ResearchAjou UniversitySuwonKorea
  2. 2.Department of Applied PhysicsBirla Institute of TechnologyMesra, RanchiIndia

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