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Journal of Materials Science

, Volume 44, Issue 7, pp 1764–1771 | Cite as

On the preparation and application of novel PVDF–POSS systems

  • Orietta MonticelliEmail author
  • Panjab Waghmare
  • Andrea Chincarini
Article

Abstract

Novel systems based on poly(vinylidene fluoride) (PVDF) and polyhedral oligomeric silsesquioxane (POSS) have been prepared by grafting amino-containing POSS (POSS–NH2) onto the surface of modified PVDF (PVDFm). Namely, the approach consists of a preliminary modification of PVDF by a chemical treatment with an alkaline solution, in order to obtain unsaturations, and a subsequent surface reaction of PVDFm with POSS molecules characterized by an amino group as reactive side. The level of polymer unsaturation, measured by Raman spectroscopy, turned out to be finely tuned by varying the dehydrofluorination reaction time. The surface grafting of POSS has been studied by SEM-EDS analysis, Raman and XPS spectroscopy. Indeed, while the level of modification of PVDFm has been found to decrease as a consequence of the reaction with POSS, thus indicating a likely saturation of double bonds by silsequioxane molecules, the Si concentration turned out to increase with increasing the concentration of the polymer surface unsaturation. The feasibility of the application of POSS grafting onto the surface of membranes, based on PVDFm, has also been verified.

Keywords

PVDF Poss Atom Transfer Radical Polymerization Atom Transfer Radical Polymerization Vinylidene Fluoride 

Notes

Acknowledgements

The present study was supported by MIUR funds (PRIN 2006, Design and Synthesis of Multifunctional Polyhedral Silsesquioxanes for Novel Thermally Stable Polymer Composites). The authors acknowledge also the support of NoE “Nanofun Poly” for the diffusion of the research results.

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Copyright information

© Springer Science+Business Media, LLC 2009

Authors and Affiliations

  • Orietta Monticelli
    • 1
    Email author
  • Panjab Waghmare
    • 1
  • Andrea Chincarini
    • 2
  1. 1.Dipartimento di Chimica e Chimica IndustrialeUniversità di Genova and INSTM NIPLAB CentreGenoaItaly
  2. 2.INFN Genova unitGenoaItaly

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