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Journal of Materials Science

, Volume 43, Issue 17, pp 5809–5822 | Cite as

Sol–gel processing and UVA patterning of epoxy-based hybrid organic–inorganic thin films

  • S. Briche
  • D. Riassetto
  • C. Gastaldin
  • C. Lamarle
  • O. Dellea
  • D. Jamon
  • E. Pernot
  • M. Labeau
  • G. Ravel
  • M. LangletEmail author
Article

Abstract

Sol–gel processed photosensitive hybrid organic–inorganic films, deposited from 2-(3,4-epoxycyclohexylethyltrimethoxysilane) (EETMOS), have been studied. EETMOS sols have been optimized with respect to several criteria that guarantee a good quality, photosensitivity, and reproducibility of derived films. Photo-sensitivity of EETMOS-based films has been assessed by UVA exposure experiments. Optimized films have been photo-patterned using a mercury lamp or a He–Cd laser source, both emitting in the UVA spectral range. Promising micronic size motives have been laser patterned. The quality of derived motives is discussed with respect to photopolymerization mechanisms and photo-patterning parameters.

Keywords

Thick Film Hybrid Film Photopolymerization Lens Position TEOS Content 

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Copyright information

© Springer Science+Business Media, LLC 2008

Authors and Affiliations

  • S. Briche
    • 1
  • D. Riassetto
    • 1
  • C. Gastaldin
    • 1
  • C. Lamarle
    • 2
  • O. Dellea
    • 2
  • D. Jamon
    • 3
  • E. Pernot
    • 1
  • M. Labeau
    • 1
  • G. Ravel
    • 4
  • M. Langlet
    • 1
    Email author
  1. 1.LMGPGrenoble INPGrenoble Cedex 1France
  2. 2.PF D2M/CEA LITENSt. EtienneFrance
  3. 3.DIOMUniversité Jean MonnetSt. EtienneFrance
  4. 4.CEA LITENGrenoble Cedex 9France

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