Journal of Materials Science

, Volume 43, Issue 6, pp 2069–2071 | Cite as

Effect of dynamic precursor gas pressure on growth behavior of amorphous Si–C–O nanorods by electron beam-induced deposition

  • Wei ZhangEmail author
  • Massayuki Shimojo
  • Kazuo Furuya

Electron beam-induced deposition (EBID) is a versatile maskless technology [1] to fabricate submicron- or nanometerscale structures from various elements in scanning electron microscope [2] as well as transmission electron microscope [3] and scanning transmission electron microscope [4]. During EBID, adsorbed precursor gas molecules on a substrate surface are irradiated and dissociated by an electron beam. This induces a chemical reaction that results in the deposition of non-volatile materials. If the electron beam is not moved relative to the substrate, a nanodot can be formed; electron beam scanning can produce nanorod within a suitable precursor gas pressure. Nanofabrication by using EBID is hence exceeding in terms of controlling the position and morphology of low dimensional functional nanostructures, e.g., carbon nanotube and ferromagnetic FePt alloy nanorods [5, 6]. It is very necessary to probe the effects of various deposition parameters on the target deposits, e.g.,...


Electron Beam FePt Holey Carbon Film Adsorbed Precursor Variable Leak Valve 


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Copyright information

© Springer Science+Business Media, LLC 2008

Authors and Affiliations

  1. 1.National Institute for Materials ScienceTsukubaJapan
  2. 2.Advanced Science Research LaboratorySaitama Institute of TechnologyOkabe-machiJapan

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