Journal of Materials Science

, Volume 43, Issue 5, pp 1644–1649 | Cite as

Microstructure and magnetic properties of electrodeposited cobalt films

  • M. S. Bhuiyan
  • B. J. Taylor
  • M. Paranthaman
  • J. R. Thompson
  • J. W. Sinclair


Cobalt films were electrodeposited onto both iron and copper substrates from an aqueous solution containing a mixture of cobalt sulfate, boric acid, sodium citrate, and vanadyl sulfate. The structural, intermetallic diffusion and magnetic properties of the electrodeposited films were studied. Cobalt electrodeposition was carried out in a passively divided cell aided by addition of vanadyl sulfate to keep the counter electrode clean. The divided electrolytic cell with very negative current densities cause the electrodeposited Co to adopt a face-centered cubic (fcc) structure, which is more magnetically reversible than the hexagonally close-packed (hcp) structured Co. The coercive field is also significantly less in the fcc-electrodeposited cobalt than in the hcp. SEM images show dense, uniform Co films without any cracks or porosity. Beside the deposition current, thickness of the film was also found to affect the crystal orientation particularly on iron substrates. Diffusion of cobalt film into the iron substrate was studied under reduced environment and a fast process was observed.


Copper Substrate Iron Substrate FeCo Alloy Cobalt Film Vanadyl Sulfate 



The authors would like to thank Rad Radhakrishnan for helpful discussions and Lee Heatherly for Auger analysis. Also, thanks go to ORISE and HTML Share facilities. This work was sponsored by the Department of Energy, Office of Basic Energy Sciences—Division of Materials Sciences and Engineering, Office of Electricity Delivery and Energy Reliability (OE). This research was performed at the Oak Ridge National Laboratory, managed by UT-Battelle, LLC for the USDOE under contract DE-AC05-00OR22725U.S.


  1. 1.
    Barrera E, Palomar Pardavé M, Batina N, González I (2000) J Electrochem Soc 147(5):1787CrossRefGoogle Scholar
  2. 2.
    Pfeifer F, Raddeloff C (1980) J Magn Magn Mater 19:190CrossRefGoogle Scholar
  3. 3.
    Yu RH, Basu S, Zhang Y, Xiao JQ (1999) J Appl Phys 85:6034CrossRefGoogle Scholar
  4. 4.
    Li L (1996) J Appl Phys 79:4578CrossRefGoogle Scholar
  5. 5.
    Major RV, Samadian V (1989) J Mater Eng 11(1):27CrossRefGoogle Scholar
  6. 6.
    Yu RH, Basu S, Zhang Y, Parvizi-Majidi A, Xiao JQ (1999) J Appl Phys 85:6655CrossRefGoogle Scholar
  7. 7.
    Kakuno EM, Mosca DH, Mazzaro I, Mattoso N, Schreiner WH, Gomes MAB (1997) J Electrochem Soc 144(9):3222CrossRefGoogle Scholar
  8. 8.
    Fontana RE (1995) IEEE Trans Magn MAG-31:2579CrossRefGoogle Scholar
  9. 9.
    Grochowski E, Scranton RA, Croll I (1994) In: Romankiw LT, Herman DA Jr (eds) Magnetic materials, processes, and devices III, vol PV 94-6. The Electrochemical Society Proceedings Series, Pennington, NJ, p 3Google Scholar
  10. 10.
    Liao SH (1990) IEEE Trans Magn MAG-26:328CrossRefGoogle Scholar
  11. 11.
    Croll IM (1980) Advances in X-ray analysis, vol 4. Plenum Press, New York, p 151Google Scholar
  12. 12.
    Croll IM, May BA (1987) In: Romanikiw LT, Turner DR (eds) Electrodeposition technology, theory and practice, vol PV 87-17. The Electrochemical Society Proceeding Series, Pennington, NJ, p 295Google Scholar
  13. 13.
    Brossared L (1991) Mater Chem Phys 27:235CrossRefGoogle Scholar
  14. 14.
    Cui CQ, Jiang SP, Tseung ACC (1991) J Electrochem Soc 138:1001CrossRefGoogle Scholar
  15. 15.
    Nishizawa T, Ishida K (1986) Met Prog 129(2):57Google Scholar
  16. 16.
    Yu RH, Basu S, Ren L, Zhang Y, Parvizi-Majidi A, Unruh KM, Xiao JQ (2000) IEEE Trans Magn 36(5):3388CrossRefGoogle Scholar
  17. 17.
    Bozorth RM (1991) Ferromagnetism. IEEE, New York Google Scholar
  18. 18.
    Ashby JA, Flower HM, Rawling RD (1977) Met Sci 11:91CrossRefGoogle Scholar
  19. 19.
    Pitt CD, Rawling RD (1981) Met Sci 15:369CrossRefGoogle Scholar
  20. 20.
    Yu RH, Zhu J (2005) J Appl Phys 97:53905CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media, LLC 2008

Authors and Affiliations

  • M. S. Bhuiyan
    • 1
  • B. J. Taylor
    • 1
    • 2
  • M. Paranthaman
    • 1
  • J. R. Thompson
    • 3
    • 4
  • J. W. Sinclair
    • 4
  1. 1.Materials Chemistry Group, Chemical Science DivisionOak Ridge National LaboratoryOak RidgeUSA
  2. 2.Tennessee Technological UniversityCookevilleUSA
  3. 3.Materials Science and Technology DivisionOak Ridge National LaboratoryOak RidgeUSA
  4. 4.Department of PhysicsUniversity of TennesseeKnoxvilleUSA

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