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Journal of Materials Science

, Volume 42, Issue 14, pp 5544–5550 | Cite as

Influences of MonoSilanolIsobutyl-POSS on thermal stability of polymethylsilxoane

  • Y. R. Liu
  • Y. D. HuangEmail author
  • L. Liu
Article

Abstract

Incorporation of polyhedral oligomeric silsesquioxane (POSS) molecules into polymer matrix resulted in increased used and decomposition temperatures. Polymethylsiloxane (PMS)/MonoSilanolIsobutyl-POSS hybrid copolymers containing various proportions of MonoSilanolIsobutyl-POSS were prepared. The structures and thermal properties of the obtained products were characterized with Gel Permeation Chromatography (GPC), Fourier transform infrared (FTIR), thermogravimetric analysis (TGA), differential thermogravimetric analysis (DTG) and X-ray photoelectron spectroscopy (XPS). The GPC and FTIR spectra suggested successful bonding of MonoSilanolIsobutyl-POSS and PMS. TGA, DTG and XPS analysis revealed that MonoSilanoIsobutyl-POSS reinforced PMS are thermally more stable than the original PMS, primarily by the elimination of SiOH effects, the nanoreinforcement effect of POSS, the retardation of polymer chain motion and the formation of SiO2 protective layer.

Keywords

Poss High Molecular Weight Polymer Methyltrimethoxy Silane SiOH Group Hybrid Copolymer 

Notes

Acknowledgements

The authors would like to thank the National Natural Science Foundation of China (No. 50333030) and the Natural Science Foundation of Heilongjiang for Distinguished Young Scholars (No. JC04-12) for financial support.

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Copyright information

© Springer Science+Business Media, LLC 2007

Authors and Affiliations

  1. 1.Polymer Materials and Engineering Division, Department of Applied Chemistry, Faculty of ScienceHarbin Institute of TechnologyHarbinP.R. China

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