Interfacial structure in silicon nitride sintered with lanthanide oxide
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Three independent research groups present a comparison of their structural analyses of prismatic interfaces in silicon nitride densified with the aid of lanthanide oxide Ln2O3. All three groups obtained scanning transmission electron microscope images which clearly reveal the presence of well-defined Ln segregation sites at the interfaces, and, moreover, reveal that these segregation sites are element-specific. While some results differ across the three research groups, the vast majority exhibits good reproducibility.
KeywordsSilicon Nitride Scanning Transmission Electron Microscope Lawrence Berkeley National Laboratory Si3N4 Ceramic Silicon Column
The group at the University of Oxford acknowledges financial support from the European Community Growth Program under the NANOAM project (Contract No. GRD2-200-3030351) in collaboration with the NSF Award (DMR-0010062). Thanks are also due to I. Tanaka for supplying the undoped silicon nitride sample, and R. M. Cannon for many useful suggestions and stimulating discussions. The group at Lawrence Berkeley National Laboratory acknowledges the financial support by the Director, Office of Science, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering of the U.S. Department of Energy Department of Energy under Contract No. DE-AC03-76SF00098, DE-AC02-05CH11231 and FG02-03ER-46057. We also would like to thank Dr. R. M. Cannon for helpful discussions. ORNL participants PFB, GSP and SJP acknowledge financial support by the US Department of Energy, Office of Basic Energy Sciences, Division of Materials Sciences and Engineering under contract DE-AC05-00OR22725 with UT-Battelle, LLC.
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