Advertisement

Journal of Materials Science

, Volume 41, Issue 14, pp 4532–4536 | Cite as

Fabrication of nanostructures with different iron concentration by electron beam induced deposition with a mixture gas of iron carbonyl and ferrocene, and their magnetic properties

  • M. TakeguchiEmail author
  • M. Shimojo
  • K. Mitsuishi
  • M. Tanaka
  • R. Che
  • K. Furuya
Article

Abstract

Electron beam induced deposition (EBID) with a mixture gas of iron carbonyl and ferrocene was carried out to fabricate nanostructures with different iron concentrations in a chamber of a scanning electron microscope. The iron concentration was controlled by changing the ratio of partial pressure of iron carbonyl and ferrocene. Electron holography observation revealed that the remanent magnetic flux density Br values of the nanostructures were also changed depending on the iron concentration.

Keywords

Iron Concentration Ferrocene Iron Carbonyl Phase Jump Stray Field 

References

  1. 1.
    Li SP, Natali M, Lebib A, Pepin A, Chen Y, Xu YB (2002) J Magn Magn Mater 241:447CrossRefGoogle Scholar
  2. 2.
    Otani Y, Pannetier B, Nozieres JP, Givord D (1993) J Magn Magn Mater 126:622CrossRefGoogle Scholar
  3. 3.
    Koops HWP, Kretz J, Rudolph M, Weber M, Dahm G, Lee KL (1994) Jpn J Appl Phys 33:7099CrossRefGoogle Scholar
  4. 4.
    Utke I, Luisier A, Hoffmann P, Laub D, Buffar PA (2002) Appl Phys Lett 81:3245CrossRefGoogle Scholar
  5. 5.
    Van Dorp WF, Van Someron B, Hagen CW, Kruit P, Crozier PA (2005) Nano Letts 5:1303CrossRefGoogle Scholar
  6. 6.
    Mitsuishi K, Shimojo M, Han M, Furuya K (2003) Appl Phys Lett 83:2064CrossRefGoogle Scholar
  7. 7.
    Takeguchi M, Shimojo M, Furuya K (2005) Nanotechnology 16:1321CrossRefGoogle Scholar
  8. 8.
    Shimojo M, Mitsuishi K, Tameike A, Furuya K (2004) J Vac Sci Technol B 22:742CrossRefGoogle Scholar
  9. 9.
    Mitsuishi K, Liu ZQ, Shimojo M, Han M, Furuya K, (2005) Ultramicroscopy 103:17CrossRefGoogle Scholar
  10. 10.
    Tanaka M, Shimojo M, Mitsuishi K, Furuya K (2004) Appl Phys A 78:543CrossRefGoogle Scholar
  11. 11.
    Kunz RR, Mayer TM (1987) Appl Phys Lett 50:962CrossRefGoogle Scholar
  12. 12.
    Utke I, Hoffmann P, Berger R, Scandella L (2002) Appl Phys Lett 80:4792CrossRefGoogle Scholar
  13. 13.
    Han M, Mitsuishi K, Shimojo M, Furuya K (2004) Phil Mag 84:1281CrossRefGoogle Scholar
  14. 14.
    Shimojo M, Takeguchi M, Tanaka M, Mitsuishi K, Furuya K (2004) Appl Phys A 79:1869CrossRefGoogle Scholar
  15. 15.
    Takeguchi M, Shimojo M, Furuya K (2005) Jpn J Appl Phys 44:5631CrossRefGoogle Scholar
  16. 16.
    Koops HWP, Kretz J, Rudolphm M, Weber M (1993) J Vac Sci Technol B 11:2386CrossRefGoogle Scholar
  17. 17.
    Schossler C, Kaya A, Kretz J, Weber M, Koops HWP (1996) Microel Eng 30:471CrossRefGoogle Scholar
  18. 18.
    Rotkina L, Lin J-F, Bird JP (2003) Appl Phys Lett 83:4426CrossRefGoogle Scholar
  19. 19.
    Lau YM, Chee PC, Thong JTL, Ng V (2002) J Vac Sci Technol A 20:1295CrossRefGoogle Scholar
  20. 20.
    Koops HWP, Kaya A, Weber M (1995) J Vac Sci Technol B 13:2400CrossRefGoogle Scholar
  21. 21.
    Liu ZQ, Mitsuishi K, Furuya K (2004) J Appl Phys 96:619CrossRefGoogle Scholar
  22. 22.
    Tanaka M, Shimojo M, Takeguchi M, Furuya K (2005) J Crystal Growth 275:2361CrossRefGoogle Scholar
  23. 23.
    Ryan MF, Eylen JR, Richardson DE (1992) J Am Chem Soc 114:8611CrossRefGoogle Scholar
  24. 24.
    Midgley PA (2001) Micron 32:167CrossRefGoogle Scholar
  25. 25.
    Biskupek J, Kaiser U, Lichte H, Lenk A, Gemming T, Pasold G, Witthuhn W (2005) J Magn Magn Mater 293:924CrossRefGoogle Scholar
  26. 26.
    Hillyard S, Silcox J (1995) Ultramicroscopy 58:6CrossRefGoogle Scholar

Copyright information

© Springer Science+Business Media, LLC 2006

Authors and Affiliations

  • M. Takeguchi
    • 1
    Email author
  • M. Shimojo
    • 1
    • 2
  • K. Mitsuishi
    • 1
  • M. Tanaka
    • 1
  • R. Che
    • 1
  • K. Furuya
    • 1
  1. 1.High Voltage Electron Microscopy StationNational Institute for Materials ScienceTsukubaJapan
  2. 2.Advanced Science Research LaboratorySaitama Institute of TechnologyOkabe-machiJapan

Personalised recommendations