Journal of Electroceramics

, Volume 13, Issue 1–3, pp 229–233 | Cite as

Annealing Effects on Structural and Dielectric Properties of Tunable BZT Thin Films

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Abstract

Ba(Zr, Ti)O3 thin films have attracted great attention in recent years for their potential use in DRAMs and MCMs due to their high dielectric constant and relatively low leakage current. However, their tunable dielectric properties were rarely investigated and the corresponding potential for tunable microwave applications was seldom reported. In this paper, we present the tunable dielectric behavior of BZT thin films deposited by RF magnetron sputtering from a Ba(Zr0.3Ti0.7)O3 ceramic target on MgO single crystal substrates. The composition, thickness and crystallinity of the thin films were analyzed by Rutherford backscattering (RBS), scanning electron microscopy (SEM) and X-ray diffraction (XRD), respectively. The dielectric constant and loss tangent were measured as a function of electric field (0–7 kV/mm) and temperature (−140 to +160°C) at frequencies up to 1 MHz, using interdigital capacitors (IDC) with Au electrodes on thin films. By optimizing the preparation process, a tunability {defined as τ = [ε (0) − ε (Emax)]/ε (0)} of 76% at Emax = 7 kV/mm and a low loss tangent of 0.0078 can be achieved. In addition, the influence of annealing temperature on the dielectric properties of the thin films is also discussed.

Keywords

Ba(Zr, Ti)O3 thin films tunable dielectric properties RF sputtering 
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Copyright information

© Kluwer Academic Publishers 2004

Authors and Affiliations

  • Jin Xu
    • 1
  • Wolfgang Menesklou
    • 1
  • Ellen Ivers-Tiffée
    • 1
  1. 1.Institut für Werkstoffe der ElektrotechnikUniversität Karlsruhe (TH)KarlsruheGermany

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