A Self-regulation Mechanism of the Resist Development Process in Integrated Circuit Fabrication and its Phase-space Picture
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- Sirakoulis, G.C. & Karafyllidis, I. J Computer-Aided Mater Des (2005) 12: 35. doi:10.1007/s10820-005-0834-0
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Lithography is the most important process in integrated circuit fabrication. Lithographic profile defect simulator based on cellular automata revealed a self-regulation mechanism of the resist development process, which is expressed as a tendency of the etch-front to retain its parabolic shape. The phase-space picture of this mechanism is an attractor and it is certified that the resit-etchant system spends much time near the unperturbed state.
Keywords:attractor cellular automata lithography self-regulation
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