Journal of Computer-Aided Materials Design

, Volume 12, Issue 1, pp 35–56 | Cite as

A Self-regulation Mechanism of the Resist Development Process in Integrated Circuit Fabrication and its Phase-space Picture

  • Georgios Ch. Sirakoulis
  • Ioannis KarafyllidisEmail author


Lithography is the most important process in integrated circuit fabrication. Lithographic profile defect simulator based on cellular automata revealed a self-regulation mechanism of the resist development process, which is expressed as a tendency of the etch-front to retain its parabolic shape. The phase-space picture of this mechanism is an attractor and it is certified that the resit-etchant system spends much time near the unperturbed state.


attractor cellular automata lithography self-regulation 


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Copyright information

© Springer 2005

Authors and Affiliations

  • Georgios Ch. Sirakoulis
    • 1
  • Ioannis Karafyllidis
    • 1
    Email author
  1. 1.Department of Electrical and Computer EngineeringDemocritus University of ThraceXanthiGreece

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