Advertisement

Fabrication of three-dimensional hemispherical structures using photolithography

  • Chee Tiong Lim
  • Hong Yee Low
  • Johnson K. K. Ng
  • Wen-Tso Liu
  • Yong Zhang
Short Communication

Abstract

A photolithography technique using SU-8 and PDMS was developed to fabricate three-dimensional hemispherical structures. This technique utilized a mask-aligner and normal binary coded photomasks to generate hemispherical pits on SU-8, followed by PDMS molding to obtain an array of dome-shaped structures. Using this technique, a microfluidic device was fabricated with a patterning area that consisted of an array of 5 μm wells and dome-shaped structures with 10 μm diameter and 6 μm height. Encoded microbeads, 6 μm in size, were immobilized and patterned in the microfluidic device under flow conditions and a DNA hybridization experiment was performed to demonstrate the incorporation of encoded beads that would enable a high level of multiplexing in bioassays.

Keywords

3D structures Microfluidics Photolithography SU-8 Soft lithography 

Notes

Acknowledgments

We would like to acknowledge the funding of this research work by the National University of Singapore, WBS no: R-397-000-027-112.

Supplementary material

10404_2009_436_MOESM1_ESM.doc (78 kb)
Electronic supplementary information (DOC 78 kb)

References

  1. Daschner W, Larsson M, Lee SH (1995) Fabrication of monolithic diffractive optical elements by the use of e-beam direct write on an analog resist and a single chemically assisted ion-beam-etching step. Appl Optics 34:2534–2539CrossRefGoogle Scholar
  2. Dutta RK, van Kan JA, Bettiol AA et al (2007) Polymer microlens replication by nanoimprint lithography using proton beam-fabricated Ni stamp. Nucl Instr Meth in Phys Res B 260:464–467CrossRefGoogle Scholar
  3. Galas JC, Belier B, Aassime A et al (2004) Fabrication of three-dimensional microstructures using standard ultraviolet and electron-beam lithography. J Vac Sci Technol B 22:1160–1162CrossRefGoogle Scholar
  4. Geissler M, Xia Y (2004) Patterning: principles and some new developments. Adv Mat 16:1249–1269CrossRefGoogle Scholar
  5. Henke W, Hoppe W, Quenzer et al (1995) Simulation-assisted design of processes for gray-tone lithography. Microelectron Eng 27:267–270CrossRefGoogle Scholar
  6. Kolarova H, Hengerer B (1996) Preparation of magnetic oligo(dT) particles. BioTechniques 20:196–198Google Scholar
  7. Lim CT, Zhang Y (2007) Bead-based microfluidic immunoassays: the next generation. Biosens Bioelectron 22:1197–1204CrossRefGoogle Scholar
  8. Oppliger Y, Sixt P, Stauffer JM et al (1994) One-step 3D shaping using a gray-tone mask for optical and microelectronic applications. Microelectron Eng 23:449–454CrossRefGoogle Scholar
  9. Schwartz B, Robbins H (1976) Chemical etching of silicon. J Electrochem Soc 123:1903–1909CrossRefGoogle Scholar

Copyright information

© Springer-Verlag 2009

Authors and Affiliations

  • Chee Tiong Lim
    • 1
  • Hong Yee Low
    • 2
  • Johnson K. K. Ng
    • 3
  • Wen-Tso Liu
    • 4
  • Yong Zhang
    • 1
  1. 1.Division of BioengineeringNational University of SingaporeSingaporeSingapore
  2. 2.Institute of Materials Research and EngineeringSingaporeSingapore
  3. 3.Department of Paediatrics, School of MedicineNational University of SingaporeSingaporeSingapore
  4. 4.Environmental Science and EngineeringNational University of SingaporeSingaporeSingapore

Personalised recommendations