Comment on “Low-level laser therapy with 940 nm diode laser on stability of dental implants: a randomized controlled clinical trial”
- 606 Downloads
I read “Low-level laser therapy with 940 nm diode laser on stability of dental implants: a randomized controlled clinical trial”. Torkzaban, P., Kasraei, S., Torabi, S. et al. Lasers Med Sci (2017). https://doi.org/10.1007/s10103-017-2365-9
Congratulations on the publication of your article. I would like to make a comment as to energy of 8 J. Is this value correct? This parameter seems to be wrong. Low energy or high energy can express stimulatory effect or inhibitory effect on the osteoblastic activity and tissue healing [1, 2, 3].
With respect to the “Osstell Mentor” device:
Has this device been validated? There are not many articles using this device in the searches. Computed tomography continues to be the best method to evaluate osseointegration and consequently to implant stability .
Thank you for publishing this interesting paper.