Optical Review

, Volume 11, Issue 4, pp 199–207

Orthogonal Aberration Functions for Microlithographic Optics

  • Tomoyuki Matsuyama
  • Tomoko Ujike


Newly developed orthogonal aberration functions are reviewed. The new functions can be utilized to express aberrations of a high NA and wide field optical system like a microlithographic projection lens. The new functions are orthogonal to each other and expressed by a simple combination of Zernike function(s) of pupil coordinates and Zernike function(s) of field coordinates.

Key words

aberration functions Zernike polynomials orthogonalization microlithographic lens wavefront aberration 


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Copyright information

© The Optical Society of Japan 2004

Authors and Affiliations

  • Tomoyuki Matsuyama
    • 1
  • Tomoko Ujike
    • 2
  1. 1.Optical Development DepartmentPrecision Equipment Company, Nikon CorporationKumagayaJapan
  2. 2.Imaging Technology Development DepartmentCore Technology Center, Nikon CorporationKumagayaJapan

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