Optical Review

, Volume 11, Issue 4, pp 199–207

Orthogonal Aberration Functions for Microlithographic Optics

  • Tomoyuki Matsuyama
  • Tomoko Ujike
Article

Abstract

Newly developed orthogonal aberration functions are reviewed. The new functions can be utilized to express aberrations of a high NA and wide field optical system like a microlithographic projection lens. The new functions are orthogonal to each other and expressed by a simple combination of Zernike function(s) of pupil coordinates and Zernike function(s) of field coordinates.

Key words

aberration functions Zernike polynomials orthogonalization microlithographic lens wavefront aberration 

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References

  1. 1.
    F. Zernike: Physica 1 (1934) 689.Google Scholar
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    T. Matsuyama: Opt. Rev. 10 (2003) 325.Google Scholar
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    T. Matsuyama: Technical Digest, 3rd Int. Conf. Optics–Photonics Design and Fabrication, Tokyo, 2002, WS05.Google Scholar
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    T. Matsuyama: Opt. Design (2003), The Optical Society of Japan [in Japanese].Google Scholar
  5. 5.
    M. Born and E. Wolf: Principles of Optics (Pergamon Press, 1980) 6th ed., p. 203.Google Scholar

Copyright information

© The Optical Society of Japan 2004

Authors and Affiliations

  • Tomoyuki Matsuyama
    • 1
  • Tomoko Ujike
    • 2
  1. 1.Optical Development DepartmentPrecision Equipment Company, Nikon CorporationKumagayaJapan
  2. 2.Imaging Technology Development DepartmentCore Technology Center, Nikon CorporationKumagayaJapan

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