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Anodic dissolution of brass and dezincing-resistant brass investigated using channel flow double electrode

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Abstract

The anodic dissolution mechanism of brass and dezincing-resistant brass in an electrolyte solution of 0.5 M NaCl containing 0.5 mM NaHCO3 was investigated using a channel flow double electrode (CFDE). CFDE is useful for investigating the anodic dissolution mechanisms of various metals because the valence of the ions dissolved from a metal working electrode can be determined by arranging a detecting electrode downstream from the working electrode. We measured the dissolution currents of cuprous ions (i Cu(I)) and cupric ions (i Cu(II)) during the measurement of the anodic polarization of brass and dezincing-resistant brass, from which we determined the potential ranges for the preferential dissolution of Zn (region (I)) and simultaneous dissolution of Cu and Zn (region (II)). The dissolution efficiency (ϕ Cu) was estimated using the anodic dissolution current of the working electrode (i W), i Cu(I), and i Cu(II), which was defined as the ratio of (i Cu(I) + i Cu(II)) and i W. ϕ Cu of brass at 0.1 and 0.2 V vs. SSE was low compared to the composition ratio of the Cu contained in the brass. This indicated that the dissolution of brass in region (II) was strongly related to the preferential dissolution of Zn from the brass surface. In contrast, the ϕ Cu of dezincing-resistant brass at 0.1 V vs. SSE was nearly identical to that at 0.2 V vs. SSE. This demonstrated that the simultaneous dissolution of Cu and Zn from the surface of dezincing-resistant brass occurred in region (II).

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Authors and Affiliations

  1. Department of Pure and Applied Chemistry, Faculty of Industrial Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba, 278-8510, Japan

    Yoshinao Hoshi, Masayuki Itagaki, Kozue Tabei & Isao Shitanda

  2. Research Institute for Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba, 278-8510, Japan

    Yoshinao Hoshi, Masayuki Itagaki & Isao Shitanda

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  1. Yoshinao Hoshi
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  2. Masayuki Itagaki
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  3. Kozue Tabei
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  4. Isao Shitanda
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Correspondence to Yoshinao Hoshi.

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Hoshi, Y., Itagaki, M., Tabei, K. et al. Anodic dissolution of brass and dezincing-resistant brass investigated using channel flow double electrode. J Solid State Electrochem 19, 3551–3557 (2015). https://doi.org/10.1007/s10008-015-2840-9

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  • DOI: https://doi.org/10.1007/s10008-015-2840-9

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