Electrocrystallization—factors influencing structure

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Abstract

The relation between layer properties and structure of the deposit is of permanent importance in the development of electrocrystallization. The continuous question is the influence of the experimental conditions on the structure and with this bridge on the properties of electrodeposits. A very important step in electrodeposition is nucleation. Some recent developments of nucleation will be discussed. An important factor to influence nucleation and growths are additives. Adsorption of additives is still described by the thermodynamic approach of adsorption isotherms. But a new impetus might provide the transfer of Pearson's hard–soft concept to adsorption on electrified interfaces. An important step is the correlation of hardness and softness with the chemical potential of electrons and the dependence of the chemical potential on the electrode potential. A further new step is the application of distributed field calculations to calculate chemical potentials of electrons. An outlook into further developments is given at the end of the article.

Keywords

Electrodeposition Nucleation Additives The hard–soft concept DFT theory 
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References

  1. 1.
    Volta A (1800); see Ostwald W (1896) Elektrochemie. Verlag von Veit and Comp., LeipzigGoogle Scholar
  2. 2.
    Faraday M (1836); see Ostwald W (1896) Elektrochemie. Verlag von Veit and Comp., LeipzigGoogle Scholar
  3. 3.
    von Jacobi MH (1837); see Ostwald W (1896) Elektrochemie. Verlag von Veit and Comp., LeipzigGoogle Scholar
  4. 4.
    Volmer M (1939) Kinetik der Phasenbildung. Theodor Steinkopf-Verlag, Dresden und LeipzigGoogle Scholar
  5. 5.
    Raub E, Müller K (1967) Fundamentals of metal deposition. Elsevier, AmsterdamGoogle Scholar
  6. 6.
    Fleischmann M, Thirsk HR (1963) In: Delahay P (ed) Advances in electrochemistry and electrochemical engineering, vol 3. Wiley, New York, p 123Google Scholar
  7. 7.
    Brenner A (1963) Electrodeposition of alloys, vols I & II. Academic, New YorkGoogle Scholar
  8. 8.
    Damaskin BB, Petrii OA, Batrakov VV (1972) Adsorption of organic compounds on electrodes. Plenum-Press, New YorkGoogle Scholar
  9. 9.
    Budevski E, Staikov G, Lorenz WJ (1996) Electrochemical phase formation and growth. VCH, Weinheim, p 149CrossRefGoogle Scholar
  10. 10.
    Winand M (1991) J Appl Electrochem 21:377CrossRefGoogle Scholar
  11. 11.
    Milchev A (1985) Electrochim Acta 30:125CrossRefGoogle Scholar
  12. 12.
    Volmer M, Weber A (1926) Z Phys Chem 119:277Google Scholar
  13. 13.
    Stoyanov S (1978) In: Kaldis E (ed) Current topics in materials science, vol 3, chap 4. Amsterdam, North-HollandGoogle Scholar
  14. 14.
    Becker R, Döring W (1935) Ann Phys 24:719CrossRefGoogle Scholar
  15. 15.
    Plieth W (2010) Galvanotechnik 100:516Google Scholar
  16. 16.
    Plieth W (2010) Russian J Electrochem 46:1119CrossRefGoogle Scholar
  17. 17.
    Pearson RG (1973) Hard and soft acids and bases. Dowden Hutchinson and Ross, StroudsbergGoogle Scholar
  18. 18.
    Mulliken RS (1934) J Chem Phys 2:782CrossRefGoogle Scholar
  19. 19.
    Parr RG, Yang W (1989) Density-functional theory of atoms and molecules. Oxford University Press, New YorkGoogle Scholar
  20. 20.
    Pearson RG (1968) J Am Chem Soc 90:319CrossRefGoogle Scholar
  21. 21.
    Plieth W (1992) Electrochim Acta 37:2115CrossRefGoogle Scholar
  22. 22.
    Plieth W (2008) Electrochemistry for materials science. Elsevier, Amsterdam, p 221Google Scholar
  23. 23.
    Spille-Kohoff A (2010) Int Confer Functional Nanocoatings, Dresden, 28.-31.3.2010Google Scholar
  24. 24.
    Lide DR (ed) (2006) CRC handbook of chemistry and physics. Taylor and Francis, Boca RatonGoogle Scholar

Copyright information

© Springer-Verlag 2011

Authors and Affiliations

  1. 1.Technische Universität DresdenDresdenGermany

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