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Microchimica Acta

, Volume 154, Issue 1–2, pp 15–20 | Cite as

Monitoring the Quality of Ultra-Pure Water in the Semiconductor Industry by Online Ion Chromatography

  • Thomas Ehmann
  • Claus Mantler
  • Detlef Jensen
  • Ralf Neufang
Conference on Ion Analysis

Abstract.

To manufacture 300 mm wafers, large quantities of ultra-pure water are required, which makes water the most important chemical used in this process. Therefore, its specification requiring ionic contaminants in the lower pg mL−1-concentration range is very strict. While inductively coupled plasma mass spectrometry (ICP-MS) is widely used for monitoring inorganic cations, ion chromatography (IC) is applied in the determination of ammonium and inorganic anions in the lower pg mL−1 range.

For routine monitoring of both ammonium and inorganic cations and inorganic anions in the lower pg mL−1 range with online IC, gradient conditions were developed using the simulation software DryLab2000. The resulting methods were subsequently validated. The limit of quantification for a concentrated sample volume of 200 mL was statistically assessed at 1–2 pg mL−1 for ammonium and some alkaline/earth alkaline cations, and at 5–10 ng L−1 for inorganic anions, respectively.

Key words: Online ion chromatography; IC; ultra-pure water (UPW); semiconductor industry. 

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References

  1. International Technology Roadmap for Semiconductors, 2004 Update, Overall Roadmap Technology Characteristics. SEMATECH, Austin, TXGoogle Scholar
  2. Ferrero, E J, Posey, D 2002J Anal At Spectrom171194Google Scholar
  3. Rostham-Khani, P, Hopstaken, M J P, Vullings, P, Noij, G, O’Halloran, O, Claassen, W 2004Appl Surf Sci231–232720Google Scholar
  4. Kyereboah-Taylor, B A 1995Am Lab2724AGoogle Scholar
  5. Vanatta, L E 1996J Chromatogr A739199CrossRefGoogle Scholar
  6. Vanatta, L E, Coleman, D E 1997J Chromatogr A770105CrossRefGoogle Scholar
  7. Nguyen, V D, Neumeister, H, Subklew, G 1999Fresenius J Anal Chem363783CrossRefGoogle Scholar
  8. Ehmann, T, Fabry, L, Moreland, J, Hage, J, Serwe, M 2000Semicond FABTECH1271Google Scholar
  9. Newton, B, Somerville, K H 2000Ultrapure Water1752Google Scholar
  10. De Borba, B M, Laikhtman, M, Rohrer, J S 2003J Chromatogr A995143CrossRefGoogle Scholar
  11. ASTM (1999) D5127-99: Standard guide for ultra pure water used in the electronics and semiconductor industry. ASTM International, West Conshohocken, PA, USA, pp 1–5Google Scholar
  12. DIN Deutsches Institut für Normung e V (1994) DIN 32645: Chemical analysis; decision limit, detection limit and determination limit; estimation in cases of repeatability, terms, methods evaluation. Beuth Verlag, Berlin, pp 1–12Google Scholar
  13. International Standard (1999) ISO 14644-1 Cleanrooms and associated controlled environments. Part 1: classification of air cleanliness. International Organization for Standardization, Genève, pp 1–24Google Scholar
  14. Molnar, I 2000J Chromatogr A965175Google Scholar
  15. DIN Deutsches Institut für Normung e V (1995) DIN EN ISO 10304-1: water quality – determination of dissolved fluoride, chloride, nitrite, orthophosphate, bromide, nitrate and sulfate ions, using liquid chromatography of ions – part 1: method for water with low contamination. Beuth Verlag, Berlin, pp 1–25Google Scholar
  16. Product Manual IONPAC® AG17 Guard Column/IONPAC® AS17 Analytical column, document no. 031529 (2002). Dionex Corporation, Sunnyvale, CA, pp 1–35Google Scholar
  17. Product Manual IONPAC® CG12 Guard Column/IONPAC® CS12 analytical column, document no. 034657 (2003). Dionex Corporation, Sunnyvale, CA, pp 1–35Google Scholar
  18. Denoncourt, J P, Egozy, Y 1986Ultrapure Water340Google Scholar
  19. Heberling, S S 1996Ultrapure Water1362Google Scholar
  20. Kunin, R, Yarnell, P 1997Ultrapure Water1458Google Scholar
  21. Goodman, J B 1994UCT6142Google Scholar
  22. Goodman, J, Andrews, S 1990Solid State Technol1365Google Scholar
  23. DryLab User’s Manual (2000). LCResources. Walnut Creeak, CAGoogle Scholar
  24. Brinkmann, T, Specht, C H, Frimmel, F H 2002J Chromatogr A95799CrossRefGoogle Scholar

Copyright information

© Springer-Verlag/Wien 2005

Authors and Affiliations

  • Thomas Ehmann
    • 1
  • Claus Mantler
    • 2
  • Detlef Jensen
    • 3
  • Ralf Neufang
    • 3
  1. 1.Central Analytical DepartmentWacker Chemie GmbHBurghausenGermany
  2. 2.Department of MetrologySiltronic AG FreibergFreibergGermany
  3. 3.Dionex GmbHIdsteinGermany

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