Microchimica Acta

, Volume 154, Issue 1–2, pp 15–20 | Cite as

Monitoring the Quality of Ultra-Pure Water in the Semiconductor Industry by Online Ion Chromatography

  • Thomas Ehmann
  • Claus MantlerEmail author
  • Detlef Jensen
  • Ralf Neufang
Conference on Ion Analysis


To manufacture 300 mm wafers, large quantities of ultra-pure water are required, which makes water the most important chemical used in this process. Therefore, its specification requiring ionic contaminants in the lower pg mL−1-concentration range is very strict. While inductively coupled plasma mass spectrometry (ICP-MS) is widely used for monitoring inorganic cations, ion chromatography (IC) is applied in the determination of ammonium and inorganic anions in the lower pg mL−1 range.

For routine monitoring of both ammonium and inorganic cations and inorganic anions in the lower pg mL−1 range with online IC, gradient conditions were developed using the simulation software DryLab2000. The resulting methods were subsequently validated. The limit of quantification for a concentrated sample volume of 200 mL was statistically assessed at 1–2 pg mL−1 for ammonium and some alkaline/earth alkaline cations, and at 5–10 ng L−1 for inorganic anions, respectively.

Key words: Online ion chromatography; IC; ultra-pure water (UPW); semiconductor industry. 


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Copyright information

© Springer-Verlag/Wien 2005

Authors and Affiliations

  • Thomas Ehmann
    • 1
  • Claus Mantler
    • 2
    Email author
  • Detlef Jensen
    • 3
  • Ralf Neufang
    • 3
  1. 1.Central Analytical DepartmentWacker Chemie GmbHBurghausenGermany
  2. 2.Department of MetrologySiltronic AG FreibergFreibergGermany
  3. 3.Dionex GmbHIdsteinGermany

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