Various optical or x-ray applications require reduction of scattered radiation on the imaging detector to produce sharper images. The scattered radiation is reduced when the radiation impacting on the detector is from a chosen small solid angle. This requires a mask in front of the detector with small holes and high aspect ratio. We are applying the SLIGA process to perform a proof-of-principle demonstration with the capability of making a large and high area anti-scattering grid. The approach is by assembling and stacking small pieces of grid. To maintain high throughput of the desired radiation, the wall of the grid has to be thin. We designed and fabricated four grid patterns all with 20 μm thick walls and 80 μm×80 μm holes. The individual pieces were 210 μm high and made of nickel. The pieces were assembled and stacked to make a 5 mm×5 mm grid 2.1 mm high. Much larger grids can be made by the SLIGA process, which was chosen because of its capability to fabricate high aspect ratio devices with precision.
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