Design and analysis of a novel MEMS spiral inductor with high quality factor
- 52 Downloads
In this paper a novel spiral inductor with high quality (Q)-factor is presented. Non-uniform current density distribution, especially in inner turn, increases the effective metal resistance due to skin and proximity effect. In order to overcome this problem, an improved inductor layout with non-uniform metal width and non-uniform spacing is proposed to increase the quality factor. For this inductor layout, from outer coil to inner coil, the metal widths are reduced but spacing between strips are increased. Mainly due to the decrease of eddy current loss by weakening the current crowding effect in the center of the spiral inductor. By reducing the current crowding effect, the effective resistance is minimized, thereby increase the quality factor. Simulation has been taken using COMSOL Multiphysics software. The results indicate that maximum value of quality factor and self-inductance of the novel inductor have been obtained about 80.34 and 324 nH, respectively. Which Q-factor improves 27% more than conventional inductors with uniform width. The dimension of the inductor is 1700 × 1660 μm.
- Chen J, Liou JJ (2004) On-chip spiral inductors for RF applications: an overview. Semicond Technol Sci 4(3):149–167Google Scholar
- Mohan SS (1999) The design, modeling and optimization of on-chip inductor and transformer circuits. PHD thesis, Stanford UniversityGoogle Scholar
- Niknejad AM, Meyer RG (2000) Design, Simulation and applications of inductors and transformers for SI RF ICs. Silicon Laboratories, Austin TX and the University of California, BerkeleyGoogle Scholar
- Saberhosseini SS, Ganji BA, Razeghi A, Mahmoudi Z (2016) Modeling and simulation of MEMS spiral inductor” 24th Iranian conference on electrical engineering (ICEE)Google Scholar