Microsystem Technologies

, Volume 21, Issue 2, pp 341–344 | Cite as

Technology of ultralong deep brain fluidic microelectrodes combined with etching-before-grinding

Technical Paper

Abstract

This paper presents a combined fabrication technique that is based on some recent advances in silicon microengineering. Buried microchannels in ultralong silicon microelectrodes thinned by etching-before grinding technology offers novel functional microdevices in the field of neural interfaces. Providing injection, sampling and electrical recording—all integrated monolithically in a long and subsequently thinned silicon microelectrode—extends translational research in fundamental neuroscience due to reduced microelectrode dimensions and functionality like stimulation and recording in deep brain region of cats or apes.

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Copyright information

© Springer-Verlag Berlin Heidelberg 2013

Authors and Affiliations

  1. 1.MEMS Lab of the Institute of Technical Physics and Materials ScienceRCNS, HASBudapestHungary

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