Microsystem Technologies

, Volume 21, Issue 2, pp 341–344 | Cite as

Technology of ultralong deep brain fluidic microelectrodes combined with etching-before-grinding

  • Zoltán FeketeEmail author
Technical Paper


This paper presents a combined fabrication technique that is based on some recent advances in silicon microengineering. Buried microchannels in ultralong silicon microelectrodes thinned by etching-before grinding technology offers novel functional microdevices in the field of neural interfaces. Providing injection, sampling and electrical recording—all integrated monolithically in a long and subsequently thinned silicon microelectrode—extends translational research in fundamental neuroscience due to reduced microelectrode dimensions and functionality like stimulation and recording in deep brain region of cats or apes.


Nervous System Disorder Neural Interface SiH2Cl2 Fluidic Functionality SiNx Film 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.



The author is grateful to the supportive staff of MTA TTK MFA MEMS Lab. and the Postdoctoral Fellowship Program of Hungarian Academy of Sciences. The inspiration of Örs Fekete is highly acknowledged.


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Copyright information

© Springer-Verlag Berlin Heidelberg 2013

Authors and Affiliations

  1. 1.MEMS Lab of the Institute of Technical Physics and Materials ScienceRCNS, HASBudapestHungary

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