Microsystem Technologies

, Volume 20, Issue 10–11, pp 1797–1802 | Cite as

High-aspect-ratio nanoporous membranes made by reactive ion etching and e-beam and interference lithography

  • Ralu Divan
  • Olga V. Makarova
  • Shelby Skoog
  • Roger Narayan
  • Anirudha V. Sumant
  • Cha-Mei Tang
  • Nicolaie Moldovan
Technical Paper
  • 352 Downloads

Abstract

Nanoporous membranes engineered to mimic natural filtration systems can be used in “smart” implantable drug delivery systems, hemodialysis membranes, bio-artificial organs, and other novel nano-enabled medical devices. Conventional membranes exhibit several limitations, including broad pore size distributions and low pore densities. To overcome these problems, lithographic approaches were used to develop porous silicon, silicon nitride, ultrananocrystalline diamond (UNCD), and polymer film membranes. Here we report processing of high porosity, high-aspect-ratio membranes by two techniques: UNCD fabricated by reactive ion etching after e-beam lithography and epoxy fabricated by interference lithography.

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Copyright information

© Springer-Verlag Berlin Heidelberg (outside the USA)  2013

Authors and Affiliations

  • Ralu Divan
    • 1
  • Olga V. Makarova
    • 2
  • Shelby Skoog
    • 3
  • Roger Narayan
    • 3
  • Anirudha V. Sumant
    • 1
  • Cha-Mei Tang
    • 4
  • Nicolaie Moldovan
    • 5
  1. 1.Argonne National LaboratoryCenter for Nanoscale MaterialsArgonneUSA
  2. 2.Creatv MicroTech Inc.ChicagoUSA
  3. 3.Joint Department of Biomedical EngineeringUniversity of North Carolina and North Carolina State UniversityRaleighUSA
  4. 4.Creatv MicroTech Inc.PotomacUSA
  5. 5.Advanced Diamond Technologies Inc.RomeovilleUSA

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