Microsystem Technologies

, Volume 16, Issue 8–9, pp 1513–1516 | Cite as

Thickness measurement in ultrathick multilayer microstructures

Technical Paper
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Abstract

Microparts are more and more mass products and quality assurance becomes an important factor in manufacturing. Based on a new optical principle, a tool was developed and tested which is well suited for easy non-destructive measurements at microstructures as well as for measurement at transparent layers. Thickness measurement of ca. 1 mm ultrathick photoresist layers on non-patterned high-reflective gold surface was demonstrated. As well, measurement of multi layer systems consisting of each several hundred micrometers thick transparent layers was verified at capped microfluidic channel structures.

Keywords

Gold Surface Microfluidic Chip Microfluidic Channel Cover Sheet Transparent Layer 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Copyright information

© Springer-Verlag 2010

Authors and Affiliations

  1. 1.micro resist technology GmbHBerlinGermany
  2. 2.Sentech Instruments GmbHBerlinGemany

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