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Microsystem Technologies

, Volume 16, Issue 7, pp 1233–1237 | Cite as

Properties of M-AFM probe affected by nanostructural metal coatings

  • A. Hosoi
  • M. Hamada
  • A. Fujimoto
  • Y. Ju
Technical Paper

Abstract

In order to develop a new structure microwave probe, the fabrication of the atomic force microscope (AFM) probe on a GaAs wafer was studied and characteristics of the AFM probe with different nanostructural metal coating were evaluated in order to understand the performance of the probe for the topography of materials and the propagation of microwave signals. A waveguide was introduced by the sputtering and the electron beam (EB) evaporation technique on the top and bottom surfaces of the GaAs AFM probe with Au or Al film. The open structure of the waveguide at the tip of the probe was introduced by using focused ion beam fabrication. It was found that the fabricated probes coated with the Au or Al film have nanometer order resolution. Moreover, using the Au-coating probe formed by the EB evaporation technique, microwave emission was detected successfully at the tip of the probe by approaching an Au film sample.

Keywords

GaAs Atomic Force Microscope Metal Film Microwave Signal Magnetic Force Microscope 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgment

This work was supported by the Japan Society for the Promotion of Science under Grant-in-Aid for Scientific Research (S) 18106003 and (A) 20246028.

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Copyright information

© Springer-Verlag 2009

Authors and Affiliations

  1. 1.Department of Mechanical Science and EngineeringNagoya UniversityChikusa-kuJapan

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