Microsystem Technologies

, Volume 12, Issue 12, pp 1143–1151 | Cite as

Low voltage actuated RF micromechanical switches fabricated using CMOS-MEMS technique

Technical Paper

Abstract

This study investigates the fabrication of radio frequency (RF) micromechanical switches with low actuation voltage using the commercial 0.35 μm double polysilicon four metal (DPFM) complementary metal oxide semiconductor (CMOS) process and the post-process. The advantages of RF micromechanical switches include low pull-down voltage and ease of post-processing. Three types of RF micromechanical switches are designed and manufactured. The RF switches are capacitive type, and the structures of the switches comprise coplanar waveguide (CPW) transmission lines, supported springs and a suspended membrane. The post-process requires only a wet etching silicon dioxide layer. Experimental results show that type-c switch needs only a pull-down voltage of 7 V.

Keywords

Micromechanical switches CMOS Post-process 

Notes

Acknowledgments

The authors would like to thank National Center for High-performance Computing (NCHC) for chip simulation, National Chip Implementation Center (CIC) for chip fabrication and the National Science Council of the Republic of China for financially supporting this research under Contract No NSC 94-2212-E-005-001.

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Copyright information

© Springer-Verlag 2006

Authors and Affiliations

  1. 1.Department of Mechanical EngineeringNational Chung Hsing UniversityTaichungTaiwan, R.O.C.

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