Development of a novel self-sensitive atomic force microscope for nondestructive measurement of micro vertical surfaces

Abstract

A novel Atomic Force Microscope for the nondestructive measurement of micro vertical surfaces have developed. This AFM have two cameras for the precise alignment of the cantilever and sample, self-sensitive cantilever that enables nondestructive measurement of micro vertical surfaces, and piezo-driven stage for minute movements of the cantilever and sample stage. With our developed AFM, we can nondestructively measure the sidewalls of dry-etched silicon wafers as small as 400 μm wide and 100 μm high.