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Microsystem Technologies

, Volume 10, Issue 6–7, pp 560–563 | Cite as

Evaluation of optical qualities of a LIGA-spectrometer in SU-8

  • T. Mappes
  • S. Achenbach
  • A. Last
  • J. Mohr
  • R. Truckenmüller
Article

Abstract

In the past few years, SU-8 negative resist has been used in addition to PMMA positive resist for MEMS applications using deep X-ray lithography [1]. The advantage of SU-8 compared to PMMA is a higher sensitivity and a higher chemical stability. However, it is not yet as well analyzed in terms of microstructure quality. In this work SU-8 was examined with regards to its suitability to be used for high-resolution MOEMS. This is done exemplarily for a LIGA microspectrometer as this device can be thoroughly analyzed evaluating the side wall quality and the optical gratings as single structures, as well as the whole optical system [2]. In order to eliminate the high damping of visible light inside solid SU-8 material, a hollow wave guide design has been chosen. SU-8 was detected to reproduce structures in the nanometer-regime, combined with an averaged peak-to-valley profile better than PMMA. Although the measured roughness of SU-8 is worse than that of PMMA, there is still a comparable damping of the signal in MOEMS for both resists.

Keywords

PMMA Visible Light Optical System Side Wall Optical Quality 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag Berlin Heidelberg 2004

Authors and Affiliations

  • T. Mappes
    • 1
  • S. Achenbach
    • 1
  • A. Last
    • 1
  • J. Mohr
    • 1
  • R. Truckenmüller
    • 1
  1. 1.Forschungszentrum KarlsruheInstitut für MikrostrukturtechnikKarlsruheGermany

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