Microsystem Technologies

, Volume 10, Issue 6, pp 560–563

Evaluation of optical qualities of a LIGA-spectrometer in SU-8

  • T. Mappes
  • S. Achenbach
  • A. Last
  • J. Mohr
  • R. Truckenmüller
Article

DOI: 10.1007/s00542-004-0403-6

Cite this article as:
Mappes, T., Achenbach, S., Last, A. et al. Microsystem Technologies (2004) 10: 560. doi:10.1007/s00542-004-0403-6

Abstract

In the past few years, SU-8 negative resist has been used in addition to PMMA positive resist for MEMS applications using deep X-ray lithography [1]. The advantage of SU-8 compared to PMMA is a higher sensitivity and a higher chemical stability. However, it is not yet as well analyzed in terms of microstructure quality. In this work SU-8 was examined with regards to its suitability to be used for high-resolution MOEMS. This is done exemplarily for a LIGA microspectrometer as this device can be thoroughly analyzed evaluating the side wall quality and the optical gratings as single structures, as well as the whole optical system [2]. In order to eliminate the high damping of visible light inside solid SU-8 material, a hollow wave guide design has been chosen. SU-8 was detected to reproduce structures in the nanometer-regime, combined with an averaged peak-to-valley profile better than PMMA. Although the measured roughness of SU-8 is worse than that of PMMA, there is still a comparable damping of the signal in MOEMS for both resists.

Copyright information

© Springer-Verlag Berlin Heidelberg 2004

Authors and Affiliations

  • T. Mappes
    • 1
  • S. Achenbach
    • 1
  • A. Last
    • 1
  • J. Mohr
    • 1
  • R. Truckenmüller
    • 1
  1. 1.Forschungszentrum KarlsruheInstitut für MikrostrukturtechnikKarlsruheGermany

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