Abstract.
High-resolution atomic channeling using velocity-controlled atoms may be able to overcome precision limitations of the conventional atom lithography. We have experimentally clarified the dependence of line width and contrast of atomic patterns in the channeling region on the velocity spread of the atomic source for the first time. Thermal or velocity-selected atomic beams prepared with a one-dimensional magneto-optical trap were employed as the atomic sources. We investigated the channeling characteristics by measuring the frequency shifts of the atomic absorption spectra in an intense standing wave light field. As a result, we can show that narrower line width and higher contrast atomic patterns are obtained as the velocity spread becomes narrower. An atomic pattern with an estimated line width of 57 nm was generated when the velocity spread of the atomic source was almost 50 m/s, that is, 1/6 that of the thermal beam.
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Received: 16 June 2001 / Published online: 7 November 2001
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Ohmukai, R., Urabe, S. & Watanabe, M. High-resolution atomic channeling using. velocity-selected atomic beam. Appl Phys B 73, 647–651 (2001). https://doi.org/10.1007/s003400100736
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DOI: https://doi.org/10.1007/s003400100736