Control of Si-rich region inside a sodalime glass by parallel femtosecond laser focusing at multiple spots
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Thermal modification and elemental distributions inside a sodalime glass were modified by parallel irradiation with focused 250 and 1 kHz femtosecond laser pulses at multiple spots. We found that the shape of a Si distribution was modified and the position of a Si-rich layer depended on the relative focal positions between 250 and 1 kHz laser pulses. We demonstrated the formation of a ribbon-shaped Si-rich glass of about 8 μm thickness and about 33 μm width by producing a line of a Si-rich layer by translating a glass sample perpendicular to the laser propagation axis. In addition, we simulated transient temperature distribution during laser exposure and discussed the role of 1 kHz laser irradiation in the modulation of elemental distributions.
KeywordsLaser Exposure Modification Line Multiple Spot Transient Temperature Distribution Molten Region
This research was supported by JSPS Grant-in-Aid for Scientific Research (A), No. 23246121 and (C), No. 26410240 and by Nippon Sheet Glass Foundation for Materials Science and Engineering.
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