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Applied Physics B

, Volume 117, Issue 2, pp 737–747 | Cite as

Asymmetric orientational writing dependence on polarization and direction in Li2O–Nb2O5–SiO2 glass with femtosecond laser irradiation

  • Chaxing Fan
  • Bertrand Poumellec
  • Rudy Desmarchelier
  • Huidan Zeng
  • Bernard Bourguignon
  • Guorong Chen
  • Matthieu Lancry
Article

Abstract

Strong birefringence photo-induced by the femtosecond laser irradiation and a sensitivity to the orientation of the laser movement versus the laboratory reference (i.e., difference between rightward and leftward or between upward and downward) have been demonstrated in 32.5Li2O–27.5Nb2O5–40SiO2 glass. An asymmetry with the orientation of the laser scanning was firstly observed by one of the authors in 2003 in pure silica (Poumellec et al. in Opt Express 11:1070, 2003). Here, we show in addition that this asymmetric orientational sensitivity is dependent on the direction of laser polarization and the laser scanning (i.e., when the direction is horizontal or vertical). In particular, no asymmetric writing is detected when both laser scanning and polarization directions are vertical. These observations are not explained by the available model.

Keywords

Refractive Index Change Pure Silica Laser Track Laser Polarization Writing Direction 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgments

This work has been done in the frame of FLAG (Femtosecond Laser Application in Glasses) consortium project with the support of several organizations: the Agence Nationale pour la Recherche (ANR-09-BLAN-0172-01), the RTRA Triangle de la Physique (2008-056T), the FP7-PEOPLE-IIF FemtoNano 908582, Shanghai Leading Academic Discipline Project (No. B502), Shanghai Key Laboratory Project (08DZ2230500), the National Natural Science Foundation of China (NSFC51072052), the Natural Science Foundation of Shanghai (12ZR1407600), and the Fundamental Research Funds for the Central Universities (WD1014035).

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Copyright information

© Springer-Verlag Berlin Heidelberg 2014

Authors and Affiliations

  • Chaxing Fan
    • 1
    • 2
  • Bertrand Poumellec
    • 2
  • Rudy Desmarchelier
    • 2
  • Huidan Zeng
    • 1
  • Bernard Bourguignon
    • 3
  • Guorong Chen
    • 1
  • Matthieu Lancry
    • 2
  1. 1.Key Laboratory for Ultrafine Materials of Ministry of Education, School of Materials Science and EngineeringEast China University of Science and TechnologyShanghaiChina
  2. 2.Institut de Chimie Moléculaire et des Matériaux d’Orsay (ICMMO), UMR CNRS-PSUD, 8182 Bâtiment 410Université de Paris Sud 11OrsayFrance
  3. 3.Institut des Sciences Moléculaires d’Orsay, UPR CNRS 3361, Bâtiment 350Université de Paris Sud 11OrsayFrance

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