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Applied Physics B

, Volume 107, Issue 3, pp 819–822 | Cite as

UV beam-assisted efficient formation of surface relief grating on azobenzene polymers

  • X. Wu
  • T. T. N. Nguyen
  • I. Ledoux-Rak
  • C. T. Nguyen
  • N. D. LaiEmail author
Article

Abstract

An efficient method is demonstrated to improve the formation of a surface relief grating (SRG) with a high amplitude. The SRG is realized by a two-beam interference technique (λ=532 nm) in an azobenzene side-chain copolymer. An UV laser beam (λ=355 nm), called assisting beam, was used to accelerate the photoisomerization process from cis-form to trans-form, resulting in a rapid cis-form ⇌ trans-form cycle. This UV beam-assisted method allowed to increase the diffraction efficiency of the formed SRG as well as its depth. Stable gratings with modulation depth as high as 410 nm were obtained at room temperature with moderate laser power.

Keywords

Diffraction Efficiency Wave Plate Holographic Data Storage Writing Beam Polarization Configuration 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgements

We are grateful to J. Lautru and A. Brosseau for invaluable help and access to the cleaning room and atomic force microscope. We also thank M. Dumont for useful discussion about the absorption spectra measurement technique. This work was partially supported by Institute d’Alembert of the ENS Cachan.

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Copyright information

© Springer-Verlag 2012

Authors and Affiliations

  • X. Wu
    • 1
    • 2
  • T. T. N. Nguyen
    • 1
    • 3
  • I. Ledoux-Rak
    • 1
  • C. T. Nguyen
    • 1
  • N. D. Lai
    • 1
    Email author
  1. 1.Laboratoire de Photonique Quantique et Moléculaire, UMR CNRS 8537Ecole Normale Supérieure de CachanCachanFrance
  2. 2.Condensed Matter PhysicsEast China Normal UniversityShanghaiChina
  3. 3.Institute of Materials ScienceVietnam Academy of Science and TechnologyCau Giay, HanoiVietnam

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