Applied Physics B

, Volume 104, Issue 1, pp 113–116

Adaptive synthesis of optical pattern for photonic crystal lithography



Intensity patterns for optical lithography are synthesized with phase-controlled multi-beam interference. By using a programmable spatial light modulator, reconfigurable intensity patterns can be generated and optimized to approach an objective intensity distribution. A self-adaptive annealing algorithm is applied to feedback control to obtain the predetermined intensity distribution. Typical photonic crystal with zigzag waveguides and micro-cavities are fabricated with a one-step-exposure lithographic technique.


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Copyright information

© Springer-Verlag 2011

Authors and Affiliations

  1. 1.State Key Laboratory of Optoelectronic Materials and TechnologiesSun Yat-sen UniversityGuangzhouChina
  2. 2.Department of PhysicsHong Kong University of Science and TechnologyKowloonChina
  3. 3.Department of Computer Science and Electrical EngineeringUniversity of MarylandBaltimoreUSA

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