Applied Physics B

, Volume 104, Issue 1, pp 113–116 | Cite as

Adaptive synthesis of optical pattern for photonic crystal lithography

Article

Abstract

Intensity patterns for optical lithography are synthesized with phase-controlled multi-beam interference. By using a programmable spatial light modulator, reconfigurable intensity patterns can be generated and optimized to approach an objective intensity distribution. A self-adaptive annealing algorithm is applied to feedback control to obtain the predetermined intensity distribution. Typical photonic crystal with zigzag waveguides and micro-cavities are fabricated with a one-step-exposure lithographic technique.

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References

  1. 1.
    R. Menon, A. Patel, D. Gil, H.I. Smith, Mater. Today 8, 26 (2005) CrossRefGoogle Scholar
  2. 2.
    J.E. Curtis, B.A. Koss, D.G. Grier, Opt. Commun. 207, 169 (2002) ADSCrossRefGoogle Scholar
  3. 3.
    S. Tay, P.-A. Blanche, R. Voorakaranam, A.V. Tunc, W. Lin, S. Rokutanda, T. Gu, D. Flores, P. Wang, G. Li, P. St Hilaire, J. Thomas, R.A. Norwood, M. Yamamoto, N. Peyghambarian, Nature 451, 694 (2008) ADSCrossRefGoogle Scholar
  4. 4.
    L.F. Hu, L. Xuan, Y.J. Liu, Z.L. Cao, D.Y. Li, Q.Q. Mu, Opt. Express 12, 6403 (2004) ADSCrossRefGoogle Scholar
  5. 5.
    J.T. Li, Y.K. Liu, X.S. Xie, P.Q. Zhang, B. Liang, L. Yan, J.Y. Zhou, G. Kurizki, D. Jacobs, K.S. Wong, Y.C. Zhong, Opt. Express 16, 12899 (2008) ADSCrossRefGoogle Scholar
  6. 6.
    Y.K. Lin, A. Harb, K. Lozano, D. Xu, K.P. Chen, Opt. Express 17, 16625 (2009) ADSCrossRefGoogle Scholar
  7. 7.
    T.Y.M. Chan, O. Toader, S. John, Phys. Rev. E 73, 046610 (2006) ADSCrossRefGoogle Scholar
  8. 8.
    K.F. Chan, Z.Q. Feng, R. Yang, A. Ishikawa, W.H. Mei, J. Microlithogr. Microfabr. Microsyst. 2, 331 (2003) ADSCrossRefGoogle Scholar
  9. 9.
    N. Konforti, E. Marom, S.-T. Wu, Opt. Lett. 13, 251 (1988) ADSCrossRefGoogle Scholar
  10. 10.
    G.Z. Yang, B.Z. Dong, B.Y. Gu, J.Y. Zhuang, O.K. Ersoy, Appl. Opt. 33, 209 (1994) ADSCrossRefGoogle Scholar
  11. 11.
    G. Sinclair, P. Jordan, J. Courtial, M. Padgett, J. Cooper, Z.J. Laczik, Opt. Express 12, 5475 (2004) ADSCrossRefGoogle Scholar
  12. 12.
    M. Notomi, K. Yamada, A. Shinya, J. Takahashi, C. Takahashi, I. Yokohama, Phys. Rev. Lett. 87, 253902 (2001) ADSCrossRefGoogle Scholar
  13. 13.
    J.W. Rinne, P. Wiltzius, Opt. Express 14, 9909 (2006) ADSCrossRefGoogle Scholar
  14. 14.
    D. Yelin, D. Meshulach, Y. Silberberg, Opt. Lett. 22, 1793 (1997) ADSCrossRefGoogle Scholar
  15. 15.
    L.Z. Cai, X.L. Yang, Y.R. Wang, Opt. Lett. 26, 1858 (2001) ADSCrossRefGoogle Scholar
  16. 16.
    W.L. Goffe, G.D. Ferrier, J. Rogers, J. Econom. 60, 65 (1994) CrossRefMATHGoogle Scholar
  17. 17.
    S. Kirkpatrick, C.D. Gelatt, M.P. Vecchi, Science 220, 671 (1983) MathSciNetADSCrossRefMATHGoogle Scholar
  18. 18.
    N.D. Lai, W.P. Liang, J.H. Lin, C.C. Hsu, Opt. Express 13, 5331 (2005) ADSCrossRefGoogle Scholar
  19. 19.
    J. Scrimgeour, D.N. Sharp, C.F. Blanford, O.M. Roche, R.G. Denning, A.J. Turberfield, Adv. Mater. 18, 1557 (2006) CrossRefGoogle Scholar
  20. 20.
    M.M. Wefers, K.A. Nelson, Opt. Lett. 18, 2032 (1993) ADSCrossRefGoogle Scholar

Copyright information

© Springer-Verlag 2011

Authors and Affiliations

  1. 1.State Key Laboratory of Optoelectronic Materials and TechnologiesSun Yat-sen UniversityGuangzhouChina
  2. 2.Department of PhysicsHong Kong University of Science and TechnologyKowloonChina
  3. 3.Department of Computer Science and Electrical EngineeringUniversity of MarylandBaltimoreUSA

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