Superlens, which is proposed to realize sub-diffraction-limited optical imaging, has been experimentally verified (N. Fang et al., Science 308, 534 (2005), D. Melville and R.J. Blaikie, Opt. Express 13, 2127 (2005)). Based on the basic experimental configuration, here we propose a metal-cladding structure developed to effectively localize the surface plasmons for projecting deep-subwavelength patterns. We give a numerical analysis on the structure and show that proper choices of incident wavelength can realize either deep-subwavelength interference patterning or high-quality optical imaging. The study presented here is believed to provide an approach for developing high-resolution optical lithography.
M. Derouard, J. Hazart, G. Lerondel, R. Bachelot, P. Adam, P. Royer, Polarization-sensitive printing of surface plasmon interferences. Opt. Express 15, 4238 (2007)
T. Xu, Y.H. Zhao, J.X. Ma, C.T. Wang, J.H. Cui, C.L. Du, X.G. Luo, Sub-diffraction-limited interference photolithography with metamaterials. Opt. Express 18, 13579 (2008)
Y. Xiong, Z. Liu, X. Zhang, Projecting deep-subwavelength patterns from diffraction-limited masks using metal-dielectric multilayers. Appl. Phys. Lett. 93, 111116 (2008)
M.D. Arnold, R.J. Blaikie, Subwavelength optical imaging of evanescent fields using reflections from plasmonic slabs. Opt. Express 15, 11542 (2007)
S. Pillai, K.R. Catchpole, T. Trupke, M.A. Green, Surface plasmon enhanced silicon solar cells. J. Appl. Phys. 101, 093105 (2007)
S.H. Lim, W. Mar, P. Matheu, D. Derkacs, E.T. Yu, Photocurrent spectroscopy of optical absorption enhancement in silicon photodiodes via scattering from surface plasmon polaritons in gold nanoparticles. J. Appl. Phys. 101, 104309 (2007)
A.J. Morfa, K.L. Rowlen, T.H. Reilly III, M.J. Romero, J. van de Lagemaat, Plasmon-enhanced solar energy conversion in organic bulk heterojunction photovoltaics. Appl. Phys. Lett. 92, 031504 (2008)