Advertisement

Applied Physics B

, Volume 89, Issue 4, pp 513–516 | Cite as

Ultrashort-pulse dual-wavelength source for digital holographic two-wavelength contouring

  • T. Hansel
  • J. Müller
  • C. Falldorf
  • C. von Kopylow
  • W. Jüptner
  • R. Grunwald
  • G. Steinmeyer
  • U. Griebner
Article

Abstract

Digital holographic shape measurements using femtosecond laser pulses are reported. For contouring of very fast moving objects, the simultaneous generation of at least two spectrally separated ultrashort pulses is required. To deliver this particular spectral signature at high pulse energies, a chirped-pulse Ti:sapphire laser amplifier was modified to emit two spectrally separated pulses with energies above 1 μJ each. The wavelength separation of these pulses was adjustable within the 50 nm gain bandwidth, cutting out two distinct wavelength peaks by a variable double-slit assembly in a prism sequence. A Michelson-type interferometer was employed to perform the two-wavelength contouring. The phases of the holograms and the phase differences are calculated numerically, which allow us to deduce the contour lines of the topology of the object. The suitability of the light source for digital holography is demonstrated with contouring of stationary objects and the potential for high-speed applications is indicated.

Keywords

Pulse Energy Coherence Length Reference Wave Digital Holography Seed Pulse 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    D. Huang, E.A. Swanson, C.P. Lin, J.S. Schuman, W.G. Schumann, W. Chang, M.R. Hee, T. Flotte, K. Gregory, C.A. Puliafito, J.G. Fujimoto, Science 254, 1178 (1991)CrossRefADSGoogle Scholar
  2. 2.
    T. Juhasz, H. Frieder, R.M. Kurtz, C. Horvath, J.F. Bille, G. Mourou, IEEE J. Sel. Top. Quantum Electron. 5, 902 (1999)CrossRefGoogle Scholar
  3. 3.
    S. Nolte, C. Momma, H. Jacobs, A. Tünnermann, B.N. Chichkov, B. Wellegehausen, H. Welling, Appl. Phys. B 14, 2716 (1997)Google Scholar
  4. 4.
    K. König, J. Microsc. 200, 83 (2000)CrossRefGoogle Scholar
  5. 5.
    T. Udem, R. Holzwarth, T.W. Hänsch, Nature 416, 233 (2002)CrossRefADSGoogle Scholar
  6. 6.
    N. Abramson, Appl. Opt. 22, 215 (1983)ADSGoogle Scholar
  7. 7.
    A.A. Friesem, U. Levy, Appl. Opt. 15, 3009 (1976)ADSGoogle Scholar
  8. 8.
    G. Pedrini, P. Froening, H.J. Tiziani, M.E. Gusev, Appl. Opt. 38, 3460 (1999)ADSGoogle Scholar
  9. 9.
    C. Falldorf, W. Osten, E. Kolenovic, Opt. Lasers Eng. 40, 543 (2003)CrossRefGoogle Scholar
  10. 10.
    Z. Wei, Y. Kobayashi, Z. Zhang, K. Torizuka, Opt. Lett. 26, 1806 (2001)CrossRefADSGoogle Scholar
  11. 11.
    A.M. Weiner, Rev. Sci. Instrum. 71, 1929 (2000)CrossRefADSGoogle Scholar
  12. 12.
    G. Imeshev, M.M. Fejer, A. Galvanauskas, D. Harter, Opt. Lett. 26, 268 (2001)CrossRefADSGoogle Scholar
  13. 13.
    S. White, J.-M. Hopkins, W.H. Knox, A. Miller, IEEE J. Quantum Electron. 38, 246 (2002)CrossRefADSGoogle Scholar
  14. 14.
    J.F. Xia, J. Song, D. Strickland, Opt. Commun. 206, 149 (2002)CrossRefADSGoogle Scholar
  15. 15.
    Z. Zhang, A.M. Deslauriers, D. Strickland, Opt. Lett. 25, 581 (2000)CrossRefADSGoogle Scholar
  16. 16.
    C.P.J. Barty, G. Korn, F. Raksi, C. Rose-Petruck, J. Squier, A.-C. Tien, K.R. Wilson, V.V. Yakovlev, K. Yamakawa, Opt. Lett. 21, 219 (1996)ADSGoogle Scholar
  17. 17.
    M. Hentschel, Z. Cheng, F. Krausz, C. Spielmann, Appl. Phys. B 70, 161 (2000)ADSGoogle Scholar
  18. 18.
    B.E.A. Saleh, M.C. Teich, Fundamentals of Photonics (Wiley, New York, 1991)Google Scholar
  19. 19.
    U. Schnars, W. Jueptner, Digital Holography (Springer, Berlin, 2005)Google Scholar
  20. 20.
    U. Schnars, J. Opt. Soc. Am. A 11, 2011 (1994)ADSCrossRefGoogle Scholar
  21. 21.
    E. Cuche, P. Marquet, C. Depeursinge, Appl. Opt. 39, 4070 (2000)ADSGoogle Scholar
  22. 22.
    J.W. Goodman, Introduction to Fourier Optics (Roberts, Englewood, CO, 2005)Google Scholar

Copyright information

© Springer-Verlag 2007

Authors and Affiliations

  • T. Hansel
    • 1
  • J. Müller
    • 2
  • C. Falldorf
    • 2
  • C. von Kopylow
    • 2
  • W. Jüptner
    • 2
  • R. Grunwald
    • 1
  • G. Steinmeyer
    • 1
  • U. Griebner
    • 1
  1. 1.Max-Born-InstitutBerlinGermany
  2. 2.Bremer Institut für angewandte StrahltechnikBremenGermany

Personalised recommendations