Applied Physics B

, Volume 87, Issue 4, pp 623–627 | Cite as

The dependence of the Fe Kα yield on the chirp of the femtosecond exciting laser pulse



The hard X-ray yield generated with femtosecond laser pulses is studied for differently chirped irradiating laser pulses. The radiation of a Ti:sapphire CPA laser system (29 fs, 750 μJ, 1 kHz) is focused onto an iron containing solid state target producing incoherent hard X-ray radiation, Bremsstrahlung as well as target-specific Kα and Kβ lines. The hard X-ray yield has been optimized by introducing negative and positive group delay dispersion (GDD) and third order dispersion (TOD) to the femtosecond laser pulse. The Kα yield could be enhanced by a factor of 1.7 and reached 1.9×108 Fe Kα photons/s in 4π with the laser pulse positively chirped, and 1.5×108 Fe Kα photons/s with the pulse negatively chirped. When the pulse energy is lowered to about 400 μJ the yield maximum at negative chirp vanishes and only the maximum at positive chirp remains. We explain this behavior with an increased electron temperature caused by the induced GDD and TOD in the pulse.


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  1. 1.
    C.W. Siders, A. Cavalleri, K. Sokolowski-Tinten, C. Toth, T. Guo, M. Kammler, M. Horn von der Hoegen, K.R. Wilson, D. von der Linde, C.J.P. Barty, Science 286, 1340 (1999)CrossRefGoogle Scholar
  2. 2.
    A. Rousse, C. Rischel, S. Fourmaux, I. Uschmann, S. Sebban, G. Grillon, P. Balcou, E. Förster, J.P. Geindre, P. Audebert, J.C. Gauthier, D. Hulin, Nature 410, 65 (2001)CrossRefADSGoogle Scholar
  3. 3.
    K. Sokolowski-Tinten, C. Blome, C. Dietrich, A. Tarasevitch, M. Horn von Hoegen, A. Cavalleri, J. Squier, M. Kammler, D. von der Linde, Phys. Rev. Lett. 22, 225701 (2001)CrossRefADSGoogle Scholar
  4. 4.
    C. Rose-Petruck, R. Jimenez, T. Guo, A. Cavalleri, C.W. Siders, F. Raksi, J.A. Squier, B.C. Walker, K.R. Wilson, C.P.J. Barty, Nature 398, 310 (1999)CrossRefADSGoogle Scholar
  5. 5.
    M. Bargheer, N. Zhavoronkov, Y. Gritsai, J.C. Woo, D.S. Kim, M. Woerner, T. Elsaesser, Science 306, 1771 (2004)CrossRefADSGoogle Scholar
  6. 6.
    K. Sokolowski-Tinten, C. Blome, J. Blums, A. Cavalleri, C. Dietrich, A. Tarasevitch, I. Uschmann, E. Förster, M. Kammler, M. Horn von Hoegen, D. von der Linde, Nature 422, 287 (2003)CrossRefADSGoogle Scholar
  7. 7.
    D. Kühlke, U. Herpers, D. von der Linde, Appl. Phys. Lett. 50, 1785 (1987)CrossRefADSGoogle Scholar
  8. 8.
    N. Zhavoronkov, Y. Gritsai, M. Bargheer, M. Woerner, T. Elsaesser, F. Zamponi, I. Uschmann, E. Förster, Opt. Lett. 30, 1737 (2005)CrossRefADSGoogle Scholar
  9. 9.
    M. Yoshida, Y. Fujimoto, Y. Hironaka, K.G. Nakamura, K. Kondo, M. Ohtani, H. Tsunemi, Appl. Phys. Lett. 73, 2393 (1998)CrossRefADSGoogle Scholar
  10. 10.
    M. Hagedorn, J. Kutzner, G. Tsilimis, H. Zacharias, Appl. Phys. B 77, 79 (2003)CrossRefGoogle Scholar
  11. 11.
    J. Kutzner, M. Silies, T. Witting, G. Tsilimis, H. Zacharias, Appl. Phys. B 78, 949 (2004)CrossRefADSGoogle Scholar
  12. 12.
    Y. Hironaka, K.G. Nakamura, K. Kondo, Appl. Phys. Lett. 77, 4110 (2000)CrossRefADSGoogle Scholar
  13. 13.
    S. Bastiani, A. Rousse, J.P. Geindre, P. Audebert, C. Quoix, G. Hamoniaux, A. Antonetti, J.-C. Gauthier, Phys. Rev. E 56, 7179 (1997)CrossRefADSGoogle Scholar
  14. 14.
    M. Berglund, L. Rymell, H.M. Hertz, Appl. Phys. Lett. 69, 1683 (1996)CrossRefADSGoogle Scholar
  15. 15.
    D.C. Eder, G. Pretzler, E. Fill, K. Eidmann, A. Saemann, Appl. Phys. B 70, 211 (2000)CrossRefADSGoogle Scholar
  16. 16.
    E. Fill, J. Bayerl, R. Tommasini, Rev. Sci. Instrum. 73, 2190 (2002)CrossRefADSGoogle Scholar
  17. 17.
    A.G. Khachatryan, F.A. van Goor, K.-J. Boller, Phys. Rev. E 70, 067601 (2004)CrossRefADSGoogle Scholar
  18. 18.
    F. Sohbatzadeh, S. Mirzanejhad, M. Ghasemi, Phys. Plasmas 13, 123108 (2006)CrossRefADSGoogle Scholar
  19. 19.
    C. Reich, P. Gibbon, I. Uschmann, E. Förster, Phys. Rev. Lett. 84, 4846 (2000)CrossRefADSGoogle Scholar
  20. 20.
    J. Yu, Z. Ziang, J.C. Kieffer, A. Krol, Phys. Plasmas 6, 1318 (1999)CrossRefADSGoogle Scholar
  21. 21.
    B. Hou, J. Nees, A. Mordovanakis, M. Wilcox, G. Mourou, L.M. Chen, J.-C. Kieffer, C.C. Chamberlain, A. Krol, Appl. Phys. B 83, 81 (2006)CrossRefADSGoogle Scholar

Copyright information

© Springer-Verlag 2007

Authors and Affiliations

  • M. Silies
    • 1
    • 2
  • S. Linden
    • 1
    • 2
  • H. Witte
    • 1
    • 2
  • H. Zacharias
    • 1
    • 2
  1. 1.Center for Nanotechnology, CeNTechMünsterGermany
  2. 2.Physikalisches InstitutWestfälische Wilhelms-UniversitätMünsterGermany

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