Fabrication and stitching of embedded multi-layer micro-gratings in fused silica glass by fs laser pulses
Fabrication and stitching of internal 2D, 1D and multi-layer micro-gratings in fused silica glass using amplified Ti:sapphire femtosecond laser were reported. These gratings have the pitch of 4 μm and the size of 400 μm×400 μm. For a two-layer 1D micro-grating where a second-layer grating was overwritten on a first-layer grating at the exact X,Y position and the different Z depth, the diffraction efficiency can reach more than 25% due to the grating thickness increase. If a second-layer grating was stitched with a first-layer by the shift of 2 μm in the X direction and at the different Z depth, the diffraction angle was doubled but the diffraction efficiency was about 9%. The last result has the potential application for fabricating high-density micro-/nano-structures beyond the diffraction limit through 3D stitching.
Unable to display preview. Download preview PDF.
- 6.J. Liu, Z. Zhang, C. Flueraru, X. Liu, S. Chang, C.P. Grover, IEEE J. Quantum Electron. QE-1, 169 (2004)Google Scholar
- 19.A.Yu. Naumov, C. Przygodzki, X. Zhu, P.B. Corkum, CLEO’99, CThC2, pp. 356–357Google Scholar
- 23.H. Kogelnik, Bell Syst. Tech. J. 48, 2909 (1969)Google Scholar