Applied Physics B

, Volume 84, Issue 1, pp 247–251

Near-field optical chemical vapor deposition using Zn(acac)2 with a non-adiabatic photochemical process

Article

DOI: 10.1007/s00340-006-2224-z

Cite this article as:
Kawazoe, T., Kobayashi, K. & Ohtsu, M. Appl. Phys. B (2006) 84: 247. doi:10.1007/s00340-006-2224-z

Abstract

We succeeded in depositing nanometric Zn dots using near-field optical chemical vapor deposition (NFO-CVD). Conventional optical CVD is based on an adiabatic photochemical process and requires UV light to excite molecules from the ground electronic state to the excited state for dissociation. By contrast, in near-field optical CVD (NFO-CVD), non-adiabatic photodissociation takes place, even with visible light, as a consequence of the steep spatial gradient of the optical power of an optical near field. This non-adiabatic process, which can be explained using the exciton–phonon polariton model, enables the photodissociation of optically inactive Zn(acac)2. We discuss experimental results using the exciton–phonon polariton model.

Copyright information

© Springer-Verlag 2006

Authors and Affiliations

  1. 1.Japan Science and Technology AgencyTokyoJapan
  2. 2.Department of PhysicsTokyo Institute of TechnologyTokyoJapan
  3. 3.Department of Electronics EngineeringUniversity of TokyoTokyoJapan

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