Applied Physics B

, Volume 81, Issue 5, pp 651–655

Direct near infrared photorefractive recording and pre-exposure controlled hole–electron competition with enhanced recording in undoped Bi12TiO20

Regular Paper

Abstract

We report the direct recording of electron-based photorefractive hologram in nominally undoped Bi12TiO20 crystals using 780 nm wavelength light without pre-exposure or any kind of previous processing. A lower intensity absorption grating is also detected. Pre-exposure with shorter wavelength produces an extended lifetime hole-based complementary grating on another photoactive center level and leads to enhanced recording.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    J.P. Huignard, F. Micheron: Appl. Phys. Lett. 29, 591 (1976)CrossRefGoogle Scholar
  2. 2.
    P. Günter, J.P. Huignard: Topics in Applied Physics: Photorefractive Materials and their Applications I, 61. Springer Verlag 1987Google Scholar
  3. 3.
    S.G. Odoulov, K.V. Shcherbin, A.N. Shumeljuk: J. Opt. Soc. Am. B 11, 1780 (1994)Google Scholar
  4. 4.
    V. Marinova, S.H. Lin, V. Sainov, M. Gospodinov, K.Y. Hsu: J. Opt. A: Pure Appl. Opt. 5, 500 (2003)CrossRefGoogle Scholar
  5. 5.
    M.C. Bashaw, T.-P. Ma, R.C. Barker, S. Mroczkowski, R.R. Dube: Phys. Rev. B 42, 5641 (1990)CrossRefGoogle Scholar
  6. 6.
    L. Boutsikaris, S. Mailis, N.A. Vainos: J. Opt. Soc. Am. B 15, 1042 (1998)Google Scholar
  7. 7.
    A. Marrakchi, R.V. Johnson, A.R. Tanguay. Jr.: J. Opt. Soc. Am. B 3, 321 (1986)Google Scholar
  8. 8.
    L. Solymar, D.J. Webb, A. Grunnet-Jepsen: The Physics and Applications of Photorefractive Materials (Clarendon Press, Oxford 1996)Google Scholar
  9. 9.
    A.A. Freschi, J. Frejlich: J. Opt. Soc. Am. B 11, 1837 (1994)Google Scholar
  10. 10.
    J. Frejlich, A.A. Kamshilin, P.M. Garcia: Opt. Lett. 17, 249 (1992)Google Scholar
  11. 11.
    H. Kogelnik: Bell Syst. Tech. J. 48, 2909 (1969)Google Scholar
  12. 12.
    G.C. Valley: J. Appl. Phys. 59, 3363 (1986)CrossRefGoogle Scholar
  13. 13.
    S. Zhivkova, M. Miteva: J. Appl. Phys. 68, 3099 (1990)CrossRefGoogle Scholar
  14. 14.
    M.C. Bashaw, T.-P. Ma, R.C. Barker, S. Mroczkowski, R.R. Dube: J. Opt. Soc. Am. B 7, 2329 (1990)Google Scholar
  15. 15.
    J. Frejlich, P.M. Garcia: Appl. Phys. A 55, 49 (1992)CrossRefGoogle Scholar
  16. 16.
    D.D. Nolte, D.H. Olson, A.M. Glass: Phys. Rev. Lett. 63, 891 (1989)CrossRefPubMedGoogle Scholar
  17. 17.
    F. Rickermann, S. Riehemann, K. Buse, D. Dirksen, G. von Bally: J.Opt.Soc. Am. B 13, 2299 (1996)Google Scholar
  18. 18.
    S. Riehemann, F. Rickermann, V.V. Volkov, A.V. Egorysheva, G. von Bally: J. Nonlinear Opt. Phys. Mater. 6, 235 (1997)CrossRefGoogle Scholar
  19. 19.
    B.C. Grabmaier, R. Oberschmid: Phys. Stat. Sol. 96, 199 (1986)Google Scholar
  20. 20.
    A. Delboulbe, C. Fromont, J. Herriau, S. Mallick, J. Huignard: Appl. Phys. Lett. 55, 713 (1989)CrossRefGoogle Scholar
  21. 21.
    A.E. Attard: J. Appl. Phys. 69, 44 (1991)CrossRefGoogle Scholar

Copyright information

© Springer-Verlag 2005

Authors and Affiliations

  1. 1.Laboratório de Óptica-Instituto de Física-IFGW-UNICAMPCampinasBrazil
  2. 2.Instituto de FísicaUniversidade Federal de GoiásGoiâniaBrazil

Personalised recommendations