Applied Physics B

, Volume 80, Issue 8, pp 941–944

The atom pencil: serial writing in the sub-micrometre domain

  • M. Mützel
  • M. Müller
  • D. Haubrich
  • U. Rasbach
  • D. Meschede
  • C. O’Dwyer
  • G. Gay
  • B. Viaris de Lesegno
  • J. Weiner
  • K. Ludolph
  • G. Georgiev
  • E. Oesterschulze
Rapid communication

Abstract

The atom pencil we describe here is a versatile tool that writes arbitrary structures by atomic deposition in a serial lithographic process. This device consists of a transversely laser-cooled and collimated cesium atomic beam that passes through a 4-pole atom-flux concentrator and impinges on to micron- and sub-micron-sized apertures. The aperture translates above a fixed substrate and enables the writing of sharp features with sizes down to 280 nm. We have investigated the writing and clogging properties of an atom pencil tip fabricated from silicon oxide pyramids perforated at the tip apex with a sub-micron aperture.

PACS

39.25.+k 81.16.-c 42.50.Vk 32.80.Pj 

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Copyright information

© Springer-Verlag 2005

Authors and Affiliations

  • M. Mützel
    • 1
  • M. Müller
    • 1
  • D. Haubrich
    • 1
  • U. Rasbach
    • 1
  • D. Meschede
    • 1
  • C. O’Dwyer
    • 2
    • 4
  • G. Gay
    • 2
  • B. Viaris de Lesegno
    • 2
    • 5
  • J. Weiner
    • 2
  • K. Ludolph
    • 3
  • G. Georgiev
    • 3
  • E. Oesterschulze
    • 3
    • 6
  1. 1.Institut für Angewandte PhysikUniversität BonnBonnGermany
  2. 2.IRSAMC/LCAR, UMR CNRS 5589Université Paul SabatierToulouse Cedex 4France
  3. 3.Institute of Microstructure Technology and AnalyticsUniversity of KasselKasselGermany
  4. 4.Photonic Nanostructures GroupTyndall National InstituteCorkIreland
  5. 5.Laboratoire Aimé CottonOrsayFrance
  6. 6.Physik und Technologie der NanostrukturenTechnische Universität KaiserslauternKaiserslauternGermany

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