Applied Physics B

, Volume 79, Issue 1, pp 83–86 | Cite as

Third-harmonic generation from ZnO films deposited by MOCVD

Article

Abstract

Third-harmonic generation (THG) was studied from ZnO thin film deposited by the metalorganic chemical vapor deposition (MOCVD) technique on sapphire substrates at different temperatures. A strong THG signal was obtained from the film deposited at an appropriate temperature. The dependence of THG on the deposition temperatures was discussed. A third-order susceptibility χ(3)=3.77×10-12 esu was deduced for a film deposited at 250 °C. This value is similar to that observed from ZnO nanocrystalline films fabricated by pulse-laser deposition (PLD). We conclude that film structure and the crystalline quality is main factors determined the THG in the film.

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Copyright information

© Springer-Verlag 2004

Authors and Affiliations

  1. 1.Photodynamics Research CenterThe Institute of Physical and Chemical Research (RIKEN)SendaiJapan
  2. 2.Department of PhysicsTonghua Teachers CollegeTonghuaChina

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