Applied Physics B

, Volume 77, Issue 5, pp 485–488 | Cite as

Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization

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Abstract

Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved.

Keywords

Microstructure Aspect Ratio High Aspect Ratio Objective Lens Photopolymerization 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
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Copyright information

© Springer-Verlag 2003

Authors and Affiliations

  1. 1.Department of Applied Physics, Chung-Cheng Institute of TechnologyNational Defense UniversityTaoyuanTaiwan
  2. 2.Medical Engineering Technology Division, Biomedical Engineering CenterIndustrial Technology Research InstituteHsin-ChuTaiwan
  3. 3.Institute of Optical SciencesNational Central UniversityTaoyuanTaiwan

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