Ultraviolet femtosecond pulses: Key technology for sub-micron machining and efficient XUV pulse generation
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A new scheme to increase the extractable energy from a table-top KrF amplifier up to 100 mJ/pulse is presented. Applications of such pulses for micro-machining and for the generation of powerful XUV radiation are demonstrated.
PACS: 42.60.Da; 42.65.Ky; 81.40.-z
© Springer-Verlag 2002