Applied Physics A

, Volume 74, Issue 4, pp 493–496 | Cite as

Laser writing techniques for photomask fabrication using a femtosecond laser

  • K. Venkatakrishnan
  • B.K.A. Ngoi
  • P. Stanley
  • L.E.N. Lim
  • B. Tan
  • N.R. Sivakumar

Abstract.

Photomasks are the backbone of microfabrication industries. Currently they are fabricated by a lithographic process, which is very expensive and time consuming since it is a multi-step process. These issues can be addressed by fabricating photomasks by direct femtosecond laser writing, which is a single-step process and comparatively cheaper and faster than lithography. In this paper we discuss our investigations on the effect of two types of laser writing techniques, namely front- and rear-side laser writing, with regard to the feature size and the edge quality of a feature. It is proved conclusively that for the patterning of masks, front-side laser writing is a better technique than rear-side laser writing with regard to smaller feature size and better edge quality. Moreover the energy required for front-side laser writing is considerably lower than that for rear-side laser writing.

PACS: 42.62.Cf; 42.65.Re 

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Copyright information

© Springer-Verlag 2001

Authors and Affiliations

  • K. Venkatakrishnan
    • 1
  • B.K.A. Ngoi
    • 1
  • P. Stanley
    • 1
  • L.E.N. Lim
    • 1
  • B. Tan
    • 1
  • N.R. Sivakumar
    • 1
  1. 1.Precision Engineering and Nanotechnology Centre, School of Mechanical and Production Engineering, Nanyang Technological University,Nanyang Avenue, Singapore 639 798SG

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