Pulse-parameter dependence of the configuration characteristics of a micro-structure in fused SiO2 induced by femtosecond laser pulses
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The fabrication of a micro-structures in fused SiO2 by femtosecond laser pulses was studied in the range of pulse duration 150∼500 fs, pulse energy 60 nJ to ∼7 μJ and wavelengths 400 nm and 800 nm. The characteristics of the cross section of the micro-structure were explained with the multiphoton-ionization and avalanche-ionization processes in the femtosecond laser-induced breakdown. The characteristics of the longitudinal length of the micro-structure relating to the direct-focusing and self-action effects are also discussed.
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