Applied Physics A

, Volume 69, Issue 5, pp 553–557 | Cite as

Epitaxial growth of metals with high Ehrlich–Schwoebel barriers and the effect of surfactants

  • J. Camarero
  • V. Cros
  • M.J. Capitán
  • J. Álvarez
  • S. Ferrer
  • M.A. Niño
  • J.E. Prieto
  • L. Gómez
  • J. Ferrón
  • A.L. Vázquez de Parga
  • J.M. Gallego
  • J.J. de Miguel
  • R. Miranda
Regular paper

Abstract.

Interlayer diffusion in epitaxial systems with a high energy barrier at the atomic steps – the so-called Ehrlich–Schwoebel (ES) barrier – is strongly reduced. As a consequence of this, a continuous accumulation of roughness takes place during growth. This undesirable effect can be corrected by using surfactant agents. We have studied the influence of the ES barrier on the preparation of epitaxial films on Cu(111), and the surfactant effect of a monolayer of Pb.

PACS: 68.35.Fx; 68.55.-a; 81.10.-h 

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Copyright information

© Springer-Verlag 1999

Authors and Affiliations

  • J. Camarero
    • 1
  • V. Cros
    • 1
  • M.J. Capitán
    • 2
  • J. Álvarez
    • 1
  • S. Ferrer
    • 2
  • M.A. Niño
    • 1
  • J.E. Prieto
    • 1
  • L. Gómez
    • 3
  • J. Ferrón
    • 4
  • A.L. Vázquez de Parga
    • 1
  • J.M. Gallego
    • 5
  • J.J. de Miguel
    • 1
  • R. Miranda
    • 1
  1. 1.Departamento de Física de la Materia Condensada and Instituto de Ciencia de Materiales “Nicolás Cabrera”, Universidad Autónoma de Madrid, Cantoblanco, 28049-Madrid, SpainES
  2. 2.European Synchrotron Radiation Facility, E.S.R.F., BP 220, F-38043 Grenoble Cedex, FranceFR
  3. 3.Instituto de Física Rosario, 2000-Rosario, ArgentinaAR
  4. 4.INTEC-CONICET, Universidad Nacional del Litoral, 3000-Santa Fe, ArgentinaAR
  5. 5.Instituto de Ciencia de Materiales, (CSIC), Cantoblanco, 28049-Madrid, SpainES

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