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Applied Physics A

, Volume 67, Issue 2, pp 155–160 | Cite as

Surface microstructure/miniature mass spectrometer:.processing and applications

  • P. Siebert
  • G. Petzold
  • Á. Hellenbart
  • J. Müller
Regular paper

3

. Its fabrication is based on techniques used in microsystem processing and in particular anisotropic etching, thin film deposition, electroplating, and anodic bonding. The mass spectrometer consists of a plasma electron source for measurand ionisation as well as an ion optic and a mass separator specifically designed for the system’s small dimensions.

Keywords

Thin Film Mass Spectrometer Small Dimension Film Deposition Plasma Electron 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag 1998

Authors and Affiliations

  • P. Siebert
    • 1
  • G. Petzold
    • 1
  • Á. Hellenbart
    • 1
  • J. Müller
    • 1
  1. 1.Arbeitsbereich Halbleitertechnologie, Technische Universität Hamburg-Harburg, Eissendorfer Str.42, D-21073 Hamburg, GermanyDE

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