Applied Physics A

, 123:722 | Cite as

Effects of complexing agents on electrochemical deposition of FeS x O y in ZnO/FeS x O y heterostructures

  • A. SupeeEmail author
  • M. Ichimura
Rapid communication


Heterostructures which consist of ZnO and FeS x O y were deposited via electrochemical deposition (ECD) for application to solar cells. Galvanostatic ECD was used in FeS x O y deposition with a solution containing 100 mM Na2S2O3 and 30 mM FeSO4. To alter the film properties, L(+)-tartaric acid (C4H6O6) and lactic acid [CH3CH(OH)COOH] were introduced as the complexing agents into the FeS x O y deposition solution. Larger film thickness and smaller oxygen content were obtained for the films deposited with the complexing agents. ZnO was deposited on FeS x O y by two-step pulse ECD from a solution containing Zn(NO3)2. For the ZnO/FeS x O y heterostructures fabricated with/without complexing agents, rectifying properties were confirmed in the current density–voltage (JV) characteristics. However, photovoltaic properties were not improved with addition of both complexing agents.


  1. 1.
    A. Ennaoui, S. Fiechter, W. Jaegermann, H. Tributsch, J. Electrochem. Soc 133, 97 (1986)CrossRefGoogle Scholar
  2. 2.
    I.J. Ferrer, D.M. Nevskaia, C. de las Heras, C. Sánchez, Solid State Commun. 74, 913 (1990)ADSCrossRefGoogle Scholar
  3. 3.
    A. Ennaoui, S. Fiechter, H. Goslowsky, H. Tributsch, J. Electrochem. Soc 132, 1579 (1985)CrossRefGoogle Scholar
  4. 4.
    A. Vedavathi, K.T. Ramakrishna Reddy, Y. Munikrishna, Reddy, IOSR J. Eng. 05, 65 (2015)Google Scholar
  5. 5.
    A. Kassim, H.S. Min, L.Y. Yee, T.W. Tee, S. Nagalingam, Can. J. Pure Appl. Sci. 6, 1863 (2012)Google Scholar
  6. 6.
    K. Manikandan, P. Mani, C. Surendra Dilip, S. Valli, P. Fermi Hilbert Inbaraj, J. Joseph Prince, Appl. Surf. Sci. 288, 76 (2014)ADSCrossRefGoogle Scholar
  7. 7.
    A. Supee, M. Ichimura, Jpn. J. Appl. Phys. 55, 081202 (2016)ADSCrossRefGoogle Scholar
  8. 8.
    D.Y. Wang, Y.T. Jiang, C.C. Lin, S.S. Li, Y.T. Wang, C.C. Chen, C.W. Chen, Adv. Mater. 24, 3415 (2012)CrossRefGoogle Scholar
  9. 9.
    S. Kawai, R. Yamazaki, S. Sobue, E. Okuno, M. Ichimura, APL Mater. 2, 032110 (2014)ADSCrossRefGoogle Scholar
  10. 10.
    K. Yang, S. Kawai, M. Ichimura, Thin Solid Films 573, 1 (2014)ADSCrossRefGoogle Scholar
  11. 11.
    M. Ichimura, H. Takagi, Jpn. J. Appl. Phys. 47, 7845 (2008)ADSCrossRefGoogle Scholar

Copyright information

© Springer-Verlag GmbH Germany 2017

Authors and Affiliations

  1. 1.Energy Management Group, Faculty of Chemical and Energy EngineeringUniversiti Teknologi MalaysiaJohor BahruMalaysia
  2. 2.Department of Engineering Physics, Electronics and MechanicsNagoya Institute of TechnologyNagoyaJapan

Personalised recommendations