Applied Physics A

, Volume 115, Issue 4, pp 1451–1455 | Cite as

Abnormal ripple patterns with enhanced regularity and continuity in a bulk metallic glass induced by femtosecond laser irradiation

Article
First Online:
Received:
Accepted:

Abstract

Two types of abnormal ripple patterns: classical ripples (C-ripples) with continuous ridges and unclassical ripples (U-ripples) with regular micropores were investigated in a Zr-based bulk metallic glass (Zr-BMG) after femtosecond laser beam irradiation. U-ripples with a period of \(\sim \)1,600 nm and the orientation nearly parallel to the polarization of laser beam were observed to form gradually on the top of C-ripples with the effective pulse number. Micropores created by the superposition of C-ripples and U-ripples had an average diameter of \(\sim \)750 nm nearly equal to the period of C-ripples (\(\sim \)720 nm) and ran along parallel lines in the grooves of U-ripples. Both U-ripples and C-ripples in Zr-BMG showed significant microstructural differences comparing with those in a conventional Zr-based alloy with the same composition and processing conditions, including much more regular and continuous ridges. The results indicate that the amorphous structure in Zr-BMG plays a key role in the uniform morphology of laser-induced structures.

Keywords

Surface Plasmon Polaritons Laser Fluence Capillary Wave Femtosecond Laser Irradiation Indium Phosphide 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.
This is a preview of subscription content, log in to check access.

Notes

Acknowledgments

The financial supports provided by High Technology Research and Development Program of China (No.2007AA03A225), New Century Excellent Talents in University, Chinese Ministry of Education (Grant no.: NCET-06-0079), and the CAS/SAFEA International Partnership Program for Creative Research Teams are gratefully acknowledged.

References

  1. 1.
    J.F. Young, J.S. Preston, H.M. van Driel, J.E. Sipe, Phys. Rev. B 27, 1155 (1983)ADSCrossRefGoogle Scholar
  2. 2.
    W. Zhang, G. Cheng, Q. Feng, L.M. Cao, F. Wang, R. Hui, Appl. Surf. Sci. 257, 4321 (2011)Google Scholar
  3. 3.
    W. Zhang, G. Cheng, Q. Feng, L.M. Cao, Appl. Surf. Sci. 258, 9452 (2012)ADSCrossRefGoogle Scholar
  4. 4.
    M. Birnbaum, J. Appl. Phys. 36, 3688 (1965)ADSCrossRefMathSciNetGoogle Scholar
  5. 5.
    J.F. Young, J.E. Sipe, H.M. van Driel, Phys. Rev. B 30, 2001 (1984)ADSCrossRefGoogle Scholar
  6. 6.
    G. Miyaji, K. Miyazaki, Appl. Phys. Lett. 89, 191902 (2006)ADSCrossRefGoogle Scholar
  7. 7.
    J.E. Sipe, J.F. Young, J.S. Preston, H.M. van Driel, Phys. Rev. B 27, 1141 (1983)ADSCrossRefGoogle Scholar
  8. 8.
    X. Wang, P. Lu, N. Dai, Y. Li, C. Liao, Y. Chang, G. Yang, Q. Zheng, App. Phys. A 89, 547 (2007)ADSCrossRefGoogle Scholar
  9. 9.
    F. Costache, S. Kouteva-Arguirova, J. Reif, App. Phys. A 79, 1429 (2004)ADSCrossRefGoogle Scholar
  10. 10.
    Q. Sun, F. Liang, R. Vallée, S. Chin, Opt. Lett. 33, 2713 (2008)ADSCrossRefGoogle Scholar
  11. 11.
    J. Bonse, J. Kruger, J. Appl. Phys. 108, 034903 (2010)ADSCrossRefGoogle Scholar
  12. 12.
    N. Semaltianos, W. Perrie, P. French, M. Sharp, G. Dearden, S. Logothetidis, K. Watkins, App. Phys. A 94, 999 (2009)ADSCrossRefGoogle Scholar
  13. 13.
    N. Semaltianos, W. Perrie, P. French, M. Sharp, G. Dearden, K. Watkins, App. Surf. Sci. 255, 2796 (2008)ADSCrossRefGoogle Scholar
  14. 14.
    N. Semaltianos, W. Perrie, J. Cheng, P. French, M. Sharp, G. Dearden, K. Watkins, App. Phys. A 98, 345 (2010)ADSCrossRefGoogle Scholar
  15. 15.
    F. Ma, J. Yang, X. Zhu, C. Liang, H. Wang, App. Surf. Sci. 256, 3653 (2010)ADSCrossRefGoogle Scholar
  16. 16.
    W. Jia, Z. Peng, Z. Wang, X. Ni, C. Wang, App. Surf. Sci. 253, 1299 (2006)ADSCrossRefGoogle Scholar
  17. 17.
    A.L. Greer, Science 267, 1947 (1995)ADSCrossRefGoogle Scholar
  18. 18.
    J. Bonse, M. Munz, H. Sturm, J. Appl. Phys. 97, 013538 (2005)ADSCrossRefGoogle Scholar
  19. 19.
    W. Zhang, G. Cheng, Q. Feng, Appl. Surf. Sci. 263, 436 (2012)ADSCrossRefGoogle Scholar
  20. 20.
    P.L. Liu, R. Yen, N. Bloembergen, R.T. Hodgson, Appl. Phys. Lett. 34, 864 (1979)ADSCrossRefGoogle Scholar
  21. 21.
    J. Yater, M.O. Thompson, Phys. Rev. Lett. 63, 2088 (1989)ADSCrossRefGoogle Scholar
  22. 22.
    P.T. Mannion, J. Magee, E. Coyne, G.M. O’Connor, T.J. Glynn, Appl. Surf. Sci. 233, 275 (2004)ADSCrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 2013

Authors and Affiliations

  1. 1.State Key Laboratory for Advanced Metals and MaterialsUniversity of Science and Technology BeijingBeijingChina
  2. 2.National Key Laboratory of Science and Technology on Power Beam ProcessesBeijing Aeronautical Manufacturing Technology Research InstituteBeijingChina
  3. 3.State Key Laboratory of Transient Optics and PhotonicsXi’an Institute of Optics and Precision Mechanics of Chinese Academy of SciencesXi’anChina
  4. 4.National Center for Materials Service SafetyUniversity of Science and Technology BeijingBeijingChina

Personalised recommendations