Applied Physics A

, Volume 115, Issue 1, pp 347–351 | Cite as

RF power dependence of refractive index of room temperature sputtered ZnO:Al thin films

  • Bhaskar Chandra Mohanty
  • Deuk Ho Yeon
  • Jae Ho Yun
  • Jun Sik Cho
  • Yong Soo Cho
Article

Abstract

The deposition power dependence of visible transmittance and refractive index of room temperature-deposited ZnO:Al thin films by RF magnetron sputtering has been studied. All films exhibited high visible transmittance and near-complete UV absorption. The refractive index of the films decreased continuously with an increase in the RF power at all photon energies in the visible and near-IR region, which has been partially attributed to the decreased packing density of the films. For each film, the refractive index exhibited strong frequency dispersion in the weak-absorption region. The origin of optical dispersion at different RF power has been discussed in the light of a single-oscillator model.

Notes

Acknowledgements

This work was financially supported by the Converging Research Center Program (2012K001270) and by the National Research Foundation of Korea (NRF) grant funded by the Korean government (MEST) (2011-0020285).

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Copyright information

© Springer-Verlag Berlin Heidelberg 2013

Authors and Affiliations

  • Bhaskar Chandra Mohanty
    • 1
    • 2
  • Deuk Ho Yeon
    • 1
  • Jae Ho Yun
    • 3
  • Jun Sik Cho
    • 3
  • Yong Soo Cho
    • 1
  1. 1.Department of Material Science and EngineeringYonsei UniversitySeoulKorea
  2. 2.School of Physics & Materials ScienceThapar UniversityPatialaIndia
  3. 3.Solar Energy DepartmentKorea Institute of Energy ResearchDeajeonKorea

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