Stable superhydrophobic surface with hierarchical mesh-porous structure fabricated by a femtosecond laser
- 725 Downloads
- 31 Citations
Abstract
Inspired by the lotus leaf, a new superhydrophobic surface with hierarchical mesh-porous structure is fabricated by femtosecond laser irradiation on silicon. The fabricated surface shows a superhydrophobic character with water contact angle being found to reach up to 158∘±1∘ and sliding angle of 4∘±0.5∘. The superhydrophobicity is stable even if the PH of solution changes from 1 to 14. And the surface also exhibits excellent self-cleaning effect and bouncing behavior, implying that the adhesion of the surface is extremely low. This work will enhance further understanding of the wettability of a solid surface with special surface morphology.
Keywords
Contact Angle Femtosecond Laser Superhydrophobic Surface Recast Layer Femtosecond Laser IrradiationNotes
Acknowledgements
This work is supported by National Science Foundation of China under the Grant Nos. 61176113, 61275008 and the Fundamental Research Funds for the Central Universities.
References
- 1.X. Yao, Y.L. Song, L. Jiang, Adv. Mater. 23, 719–734 (2011) CrossRefGoogle Scholar
- 2.T. Verho, C. Bower, P. Andrew, S. Franssila, O. Ikkala, R.H.A. Ras, Adv. Mater. 23, 673–678 (2011) CrossRefGoogle Scholar
- 3.X.M. Li, D. Reinhoudt, M.C. Calama, Chem. Soc. Rev. 36, 1350–1368 (2007) CrossRefGoogle Scholar
- 4.W. Song, D.D. Veiga, C.A. Custodio, J.F. Mano, Adv. Mater. 21, 1830–1834 (2009) CrossRefGoogle Scholar
- 5.Z. Wang, C. Lopez, A. Hirsa, N. Koratkar, Appl. Phys. Lett. 91, 023105 (2007) ADSCrossRefGoogle Scholar
- 6.S. Gou, M. Mossman, L. Whitehead, Appl. Opt. 51(11), 1645–1653 (2012) ADSCrossRefGoogle Scholar
- 7.F. Xia, L. Jiang, Adv. Mater. 20, 2842–2858 (2008) CrossRefGoogle Scholar
- 8.W. Barthlott, C. Neinhuis, Planta 202, 1–8 (1997) CrossRefGoogle Scholar
- 9.M. Barberoglou, V. Zorba, E. Stratakis, P. Tzanetakis, S.H. Anastasiadis, C. Fotakis, Appl. Surf. Sci. 255, 5425–5429 (2009) ADSCrossRefGoogle Scholar
- 10.V. Zorba, E. Stratakis, M. Barberoglou, E. Spanakis, P. Tzanetakis, S.H. Anastasiadis, C. Fotakis, Adv. Mater. 20, 4049–4054 (2008) CrossRefGoogle Scholar
- 11.J. Genzer, K. Efimenko, Biofouling 22, 339–360 (2006) CrossRefGoogle Scholar
- 12.Z.G. Cheng, L. Feng, L. Jiang, Adv. Funct. Mater. 18, 3219–3225 (2008) CrossRefGoogle Scholar
- 13.L. Feng, S. Li, Y. Li, Adv. Mater. 14, 1857–1860 (2002) CrossRefGoogle Scholar
- 14.Z.G. Guo, F. Zhou, J.C. Hao, W.M. Liu, J. Am. Chem. Soc. 127, 15670–15671 (2005) CrossRefGoogle Scholar
- 15.Y.K. Lai, X.F. Gao, H.F. Zhuang, J.Y. Huang, C.G. Lin, L. Jiang, Adv. Mater. 21, 3799–3803 (2009) ADSCrossRefGoogle Scholar
- 16.I. Banerjee, R.C. Pangule, R.S. Kane, Adv. Mater. 23, 690–718 (2011) CrossRefGoogle Scholar
- 17.X. Zhang, F. Shi, J. Niu, Y.G. Jiang, Z.Q. Wang, J. Mater. Chem. 18, 621–633 (2008) CrossRefGoogle Scholar
- 18.L. Coriand, M. Mitterhuber, A. Duparré, A. Tünnermann, Appl. Opt. 50(9), C257–C263 (2011) CrossRefGoogle Scholar
- 19.N.J. Shirtcliffe, S. Aqil, C. Evans, G. Mchale, M.I. Newton, C.C. Perry, P. Roach, J. Micromech. Microeng. 14, 1384–1389 (2004) ADSCrossRefGoogle Scholar
- 20.F. Chen, D.S. Zhang, Q. Yang, X.H. Wang, B.J. Dai, J.H. Si, X. Hou, Langmuir 21, 359–365 (2011) CrossRefGoogle Scholar
- 21.D.S. Zhang, F. Chen, Q. Yang, J.H. Si, X. Hou, Soft Matter 7, 8337–8342 (2011) ADSCrossRefGoogle Scholar
- 22.J.H. Zhang, Y.Y. Li, X.M. Zhang, B. Yang, Adv. Mater. 22, 4249–4269 (2010) CrossRefGoogle Scholar
- 23.D.G. Shchukin, E. Skorb, V. Belova, H. Mohwald, Adv. Mater. 23, 1922–1934 (2011) CrossRefGoogle Scholar
- 24.D. Zahner, J. Abagat, F. Svec, J.M.J. Frechet, P.A. Levkin, Adv. Mater. 23, 3030–3034 (2011) CrossRefGoogle Scholar
- 25.B. Cortese, S. D’Amone, M. Manca, I. Viola, R. Cingolani, G. Gigli, Langmuir 24, 2712–2718 (2008) CrossRefGoogle Scholar
- 26.R.B. Pernites, R.R. Ponnapati, R.C. Advincula, Adv. Mater. 23, 3207–3213 (2011) CrossRefGoogle Scholar
- 27.X.H. Wang, F. Chen, H.W. Liu, W.W. Liang, Q. Yang, J.H. Si, X. Hou, Opt. Commun. 284, 317–321 (2011) ADSCrossRefGoogle Scholar
- 28.J. Bonse, K.W. Brzeinka, A.J. Meixner, Appl. Surf. Sci. 221, 215–230 (2004) ADSCrossRefGoogle Scholar
- 29.D.S. Zhang, F. Chen, J.Z. Shi, H.W. Liu, H. Wang, J.H. Si, X. Hou, Ferroelectrics 387, 130–136 (2009) CrossRefGoogle Scholar
- 30.J. Bonse, S. Bandach, J. Kruger, W. Kautek, M. Lenzer, Appl. Phys. A 74, 19–25 (2002) ADSCrossRefGoogle Scholar
- 31.M. Zhou, H.F. Yang, B.J. Dai, J.K. Di, E.L. Zhao, L. Cai, Appl. Phys. A 94, 571–576 (2009) ADSCrossRefGoogle Scholar
- 32.M.Y. Shen, C.H. Crouch, J.E. Carey, E. Mazur, Appl. Phys. Lett. 85(23), 5694–5696 (2004) ADSCrossRefGoogle Scholar
- 33.R. Le Harzic, H. Schuck, D. Sauer, T. Anhut, I. Riemann, Opt. Express 13, 6651–6656 (2005) ADSCrossRefGoogle Scholar
- 34.H.W. Liu, F. Chen, X.H. Wang, Q. Yang, H. Bian, J.H. Si, X. Hou, Thin Solid Films 518, 5188–5194 (2010) ADSCrossRefGoogle Scholar
- 35.G. Daminelli, J. Kruger, W. Kautek, Thin Solid Films 467, 334–341 (2004) ADSCrossRefGoogle Scholar
- 36.D.S. Zhang, F. Chen, H.W. Liu, X.H. Wang, K. Du, J.H. Si, X. Hou, Chin. Sci. Bull. 55, 877–881 (2010) CrossRefGoogle Scholar
- 37.T. Baldacchini, J.E. Carey, M. Zhou, E. Mazur, Langmuir 22, 4917–4929 (2006) CrossRefGoogle Scholar
- 38.D. von der Linde, K. Sokolowski-Tinten, J. Bialkowski, Appl. Surf. Sci. 109, 1–10 (1997) CrossRefGoogle Scholar
- 39.A. Ben-Yakar, A. Harkin, J. Ashmore, R. Byer, H.A. Stone, J. Phys. D, Appl. Phys. 40, 1447–1459 (2007) ADSCrossRefGoogle Scholar
- 40.B. Hao, H.W. Liu, F. Chen, Q. Yang, P.B. Qu, G.Q. Du, J.H. Si, X.H. Wang, X. Hou, Opt. Express 20, 12939–12948 (2012) ADSCrossRefGoogle Scholar
- 41.L. Feng, S.H. Li, H.J. Li, J. Zhai, Y.L. Song, L. Jiang, D.B. Zhu, Angew. Chem. 114, 1269–1271 (2002) CrossRefGoogle Scholar
- 42.A.B.D. Cassie, S. Baxter, Trans. Faraday Soc. 40, 546–551 (1944) CrossRefGoogle Scholar
- 43.D. Richard, D. Quere, Europhys. Lett. 50(6), 769–775 (2000) ADSCrossRefGoogle Scholar
- 44.A.L. Boance, F. Chevy, C. Clanet, G. Lagubeau, D. Quere, J. Fluid Mech. 554, 47–66 (2006) ADSCrossRefGoogle Scholar